Making Anodic Alumina Thin Films Having a Pore Array

Abstract

An experimental investigation is reported into the influence of the grain structure of a starting Al film on the surface and bulk structure of the resulting porous anodic-oxide film with a view to making pore arrays based on oxide thin films. The electrolytes employed essentially contain a rare-earth metal. Anodic-oxide films are obtained with thicknesses ranging from 1.0 to 2.5 µ m and with a cell diameter uniform within 8% over an area of 5 × 5 µ m 2 , the grain diameter of the Al film being 0.60-0.83 µ m. THIN FILMS

Vortex matching effects in Nb thin films due to Ni nanopillars embedded in anodic aluminum oxide substrates

“…It also influences the size of the grains of the Al layer deposited on it, which turn out to be finer compared to the case in which an Al film is deposited directly on Si/SiO x . Finally, this procedure also refines the structure of the porous aluminum oxide insulating layer (see below) [15]. Afterwards, by using standard photolithography a positive photoresist of area 1 × 1 cm 2 was put on the top surface of the Al film.…”