2011
DOI: 10.1063/1.3657135
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Manipulating InAs nanowires with submicrometer precision

Abstract: InAs nanowires are grown epitaxially by catalyst-free metal organic vapor phase epitaxy and are subsequently positioned with a lateral accuracy of less than 1 μm using simple adhesion forces between the nanowires and an indium tip. The technique, requiring only an optical microscope, is used to place individual nanowires onto the corner of a cleaved-edge wafer as well as across predefined holes in Si3N4 membranes. The precision of the method is limited by the stability of the micromanipulators and the precisio… Show more

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Cited by 36 publications
(26 citation statements)
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“…Fig. 3 displays the diameter dependence of the thermal conductivity of Bi NWs, measured using the suspended microdevice (inset) at room temperature, with five different diameters 40,69,203,230, and 301 nm. The previous thermal conductivity data, obtained using single-crystalline Bi NWs grown by same method (OFFON) 23 and AAO templates, 38 confirm the reliability of the measurements.…”
Section: Seebeck Coefficientmentioning
confidence: 99%
See 1 more Smart Citation
“…Fig. 3 displays the diameter dependence of the thermal conductivity of Bi NWs, measured using the suspended microdevice (inset) at room temperature, with five different diameters 40,69,203,230, and 301 nm. The previous thermal conductivity data, obtained using single-crystalline Bi NWs grown by same method (OFFON) 23 and AAO templates, 38 confirm the reliability of the measurements.…”
Section: Seebeck Coefficientmentioning
confidence: 99%
“…A Bi NW with such a small diameter (d < 40 nm) could not sustain when placed between the two membranes of the suspended microdevice, and a few dispersed Bi NWs were cracked during the drop casting. To place a selected Bi NW of such a diameter on the suspended microdevice, a nano-manipulator system 40,41 is preferred instead of the drop-casting method, in which the membranes were bent by the dropped solution.…”
Section: Seebeck Coefficientmentioning
confidence: 99%
“…The gates are covered by a 10 nm layer of HfO 2 dielectric. Using a micromanipulator 28 the nanowires with a typical length of 4 µm and diameter of 30 nm are placed on top of these gates as shown in the inset of Fig. 1.…”
mentioning
confidence: 99%
“…The chemical stability, atomic flatness, and high breakdown voltage, 21 together with the well established dry transfer mechanism 22 makes hBN an ideal dielectric for our nanowire devices. InSb nanowires grown by metal-organic vapor phase epitaxy 23,24 (1 -3µm long and 70 -90nm diameter) are transferred deterministically with a micro-manipulator 25 onto the hBN dielectric. Electrical contacts to the nanowire (evaporated Cr/Au (10/100 nm), 150 -400nm spacing) are defined by electron beam lithography.…”
mentioning
confidence: 99%