2022
DOI: 10.1002/aelm.202101288
|View full text |Cite
|
Sign up to set email alerts
|

Manipulating Strain in Transistors: From Mechanically Sensitive to Insensitive

Abstract: Figure 4. Possible applications of stretchable and flexible FETs.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(2 citation statements)
references
References 161 publications
(154 reference statements)
0
2
0
Order By: Relevance
“…Due to the considerable lattice mismatch, as well as the difference in thermal expansion coefficients, the as-grown 2DLMs are frequently strained. This strain effect may be exploited to engineer or enhance the functionalities of the 2DLMs on perovskite oxides, but many further investigations are required to understand and manipulate this effect.…”
Section: Fabrication and Interfacial Properties Of 2dlm-perovskite Ox...mentioning
confidence: 99%
“…Due to the considerable lattice mismatch, as well as the difference in thermal expansion coefficients, the as-grown 2DLMs are frequently strained. This strain effect may be exploited to engineer or enhance the functionalities of the 2DLMs on perovskite oxides, but many further investigations are required to understand and manipulate this effect.…”
Section: Fabrication and Interfacial Properties Of 2dlm-perovskite Ox...mentioning
confidence: 99%
“…A daunting challenge is to realize encapsulated transistors exhibiting strain-insensitive barrier performance under mechanical bending strains, which means that electrical properties, such as threshold voltage and mobility, must remain stable or exhibit negligible variations [ 16 , 17 , 18 , 19 , 20 ]. However, unencapsulated devices have ultrathin channels with fracture limits (~1% for Si NM), and thus the critical parameters usually change with the external strain [ 21 , 22 ].…”
Section: Introductionmentioning
confidence: 99%