This study aims to enhance the ion implanter performance by developing an innovative heating tube integrated within the bushing to improve temperature control. Gases such as PH3, AsH3, BF3, and GeF4 are ionized applying a high voltage of up to 80 kV in ion implanters. An ion beam is extracted from an electrode. Residual gases tend to be deposited inside the bushing when a bushing is operated at relatively low temperatures. The leakage current flows through the bushing owing to the deposited residual gas layer. This results in arcing due to potential differences. To address this issue, our approach involves designing and implementing a heating tube within the bushing, accompanied by the injection of a heating liquid to raise the temperature. The proposed heating system aims to prevent gas deposition and enhance the efficiency of the deposition process. The effectiveness of this solution is evaluated through a combination of experiments and simulations using a computational fluid dynamics software. Experimental results agree well with those of the simulation. Through these integrated experimental and simulation studies, we anticipate a significant enhancement in deposition process efficiency. The findings contribute valuable insights into optimizing ion implanter performance and reducing the need for frequent bushing replacements.