AIP Conference Proceedings 2008
DOI: 10.1063/1.3033638
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Manufacturing Assessment of an XeF[sub 2] In-Situ Clean Process for Mitigation of Species Cross Contamination

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“…[9] Thomas et al [10] demonstrated an effective method using fluorine cleaning chemistry to eliminate accumulated residues inside the ion implanter. Dieter et al [11] enhanced the ion source lifespan from 168 hours to 208 hours, which is approximately a 24% improvement, by installing XeF2 in the SDS (Safe Delivery Source) gas string and running Xe + beams inside the ion source for 15 min every 12 h. James et al [12] evaluated a new XeF2 in-situ clean process as an effective means for reducing the risk of species cross-contamination. Ruipeng et al [13] employed pre-Ni silicide including selective removal of oxides to minimize Si and Ni losses, spike removal at the NiSi/Si interface, reduction of pipe defects, and elimination of queue-time dependency.…”
Section: Introductionmentioning
confidence: 99%
“…[9] Thomas et al [10] demonstrated an effective method using fluorine cleaning chemistry to eliminate accumulated residues inside the ion implanter. Dieter et al [11] enhanced the ion source lifespan from 168 hours to 208 hours, which is approximately a 24% improvement, by installing XeF2 in the SDS (Safe Delivery Source) gas string and running Xe + beams inside the ion source for 15 min every 12 h. James et al [12] evaluated a new XeF2 in-situ clean process as an effective means for reducing the risk of species cross-contamination. Ruipeng et al [13] employed pre-Ni silicide including selective removal of oxides to minimize Si and Ni losses, spike removal at the NiSi/Si interface, reduction of pipe defects, and elimination of queue-time dependency.…”
Section: Introductionmentioning
confidence: 99%