Deposition of thin-films used in MEMS and NEMS devices rely on a wide variety of technologies. Physical vapor deposition (PVD) uses physical effects like evaporation or ion bombardment to create thin-films on a substrate by forcing source atoms into a gaseous phase. Chemical vapor deposition (CVD) and similar processes create coatings by a chemical reaction of volatile species by using reaction processes defined by chemical reaction equations. While PVD and CVD are dry processes, for depositing conductive thin-films the substrate may be submerged in an electrically conductive liquid (an electrolyte) and subjected to electrochemical or chemical deposition. Spin-coating and spray-coating are two examples of technologies that lend themselves to creating organic films-a technology widely used in depositing photoresists in photolithography. Dip processes like solgel may be used for the creation of oxide coatings.