Mapping the nanoscale effects of charge traps on electrical transport in grain structures of indium tin oxide thin films

Abstract

We report the mapping of the nanoscale effects of charge trap activities in the grain structures of an oxygen plasma−treated Indium tin oxide (ITO) thin film. Here, a conducting Pt...

Unraveling the limiting factors to electron mobility in degenerately doped SnO2 thin films

“…This clearly explains the small contribution of grain boundary scattering (by carrier scattering at {101} CSPs). The results of the fits are in the similar range (∼10 13 cm −2 ) as the experimental data measured by Jeon et al on In-doped SnO 2 (ITO) sample [24].…”

“…Thus the dependence μ(n) strongly depends on the trap density at grain boundaries, which in turn depends on the deposition conditions such as oxygen partial pressure, temperature, or post-deposition treatment. For instance, Jeon et al have examined the impact of charge trap activities on electron transport within the grain structures of an In doped SnO 2 (ITO) thin film treated with oxygen plasma and revealed that the regions at the boundaries of the grains had a higher density of charge traps and thus a lower conductance compared to the areas inside the grains of the thin film [24]. 8.17 The authors also estimated the trap density at ITO grain boundaries at about 3 × 10 13 cm −2 .…”

Single-Particle Spectroelectrochemistry: Promoting the Electrocatalytic Activity of Gold Nanorods via Oxygen Plasma Treatment without Structural Deformation

“…The formation of the Au-ITO heterojunction as a result of the plasma treatment, as well as the difference in the Fermi levels of Au and ITO, facilitates the transfer of excess plasma electrons from Au to ITO, thereby preventing the structural deformation of the AuNRs. Besides that, oxygen plasma treatment increases the conductivity of ITO by removing carbon contaminants, thus inducing surface dipole formation and increasing the charge carrier density of the ITO substrate. , These may result in increased work function of ITO, − therefore enhancing the high-energy electrons transferred to ITO without damaging the AuNR structure. Since the transmittance spectra of untreated and various time oxygen plasma-treated ITO substrates (Figure S6A,B) do not show a significant difference, the increased work function of the ITO substrate due to plasma treatment may have little or negligible impact on the LSPR spectrum.…”

“…Besides that, oxygen plasma treatment increases the conductivity of ITO by removing carbon contaminants, thus inducing surface dipole formation and increasing the charge carrier density of the ITO substrate. 29,30 These may result in increased work function of ITO, 30−32 therefore enhancing the high-energy electrons transferred to ITO without damaging the AuNR structure.…”

“…Oxygen plasma treatment using high-energy plasma electrons and ions has frequently been used to remove organic impurities from the surfaces of these nanoparticles. ,,− Additionally, oxygen plasma treatment may induce changes on the surfaces and in the morphologies of AuNPs. , This treatment may also enhance the electrochemical sensing capabilities and catalytic activity of AuNPs by tuning the surface charges of these nanoparticles . The effects of oxygen plasma treatment on charge carrier density and the work function of ITO have been reported earlier. − Thus, far, conventional electrochemical techniques, as well as DF microscope-based spectroelectrochemical techniques, have been employed to analyze the electrocatalytic decomposition of H 2 O 2 using AuNPs. However, the effects of oxygen plasma treatment on the surface charges of AuNPs and the electrocatalytic decomposition of H 2 O 2 using AuNPs immobilized on an ITO surface have yet to be reported.…”