Maskless nanostructure photolithography by ultrahigh-order modes of a symmetrical metal-cladding waveguide

Abstract

To fabricate fine patterns beyond the diffraction limit, a nanostructure photolithography technique is required. In this Letter, we present a method that allows sub-100-nm lines to be patterned photolithographically using ultrahigh-order modes from a symmetrical metal-cladding waveguide (SMCW) in the near field, which are excited by continuous-wave visible light without focusing. The etching depth of the nanopattern reaches more than 200 nm. The localized light intensity distribution can be used to map the photoresist exposure pattern, which agrees well with our theoretical model. This technique opens up the possibility of localizing light fields below the diffraction limit using maskless and lower power visible light.

Tunable Narrowband Carbon Quantum Dots Laser Based on Self‐Assembled Microstructure

“…By employing free coupling technology, the incident light forms a standing wave field inside the HMCR, as the group velocity of light becomes nearly zero. [ 22 ] This leads to an enhancement in the fluorescence intensity of CQDs within the standing wave field. Additionally, the resonance frequency of the mode is localized and enhanced due to mode resonance.…”