Maskless patterning of indium tin oxide layer for flat panel displays by diode-pumped Nd:YLF laser irradiation

Takai, M.; Bollmann, D.; Haberger, K.

doi:10.1063/1.111980

Cited by 52 publications

(27 citation statements)

References 3 publications

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“…Besides, removal of ITO film by SHG YAG laser has been tried [6]. However, the comparison of machining results between wavelengths has been mainly described, and detailed investigation has not been done yet.…”

Section: Introductionmentioning

confidence: 99%

Micro machining of ITO film by LD-pumped SGH YAG laser

2003

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ITO film, which is a kind of transparent conductive film, has been used for LCD, PDP and so on. This film is mostly removed by wet etching method. However, this method needs many chemicals, numbers of process and large-size equipments. On the other hand, laser beam processing can achieve the dry process without chemicals and drastically reduces the number of process. Therefore, selective removal of ITO film on glass substrate by LD pumped Q-switch SHG YAG laser is experimentally investigated. Electric insulation across machined groove was successful. Better groove shape can be obtained by accurate control of defocused distance and feed rate under a constant average power. Using SHG YAG laser makes it possible to remove only ITO film without any damage to glass material as substrate, since SHG YAG laser of 532 nm in wavelength is easy to transmit the glass material. When laser beam is irradiated from ITO film to glass material, a non-removed portion of ITO film remains at the bottom of groove under long defocused distance condition. On the other hand, backside irradiation method, in which laser beam is irradiated to ITO film through glass material, can prevent from remaining a non-removed portion, since absorption of laser beam occurs from the boundary part between ITO film and glass material.

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Section: Introductionmentioning

confidence: 99%

Micro machining of ITO film by LD-pumped SGH YAG laser

2003

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“…The size of the features obtained by this method varies from several hundred nanometers to a few micrometers. Several aspects of the present work are also relevant for other emerging applications of laser processing, e.g., micromachining of indium tin oxide, which is a semiconducting ceramic used in flat-panel displays [3].…”

Section: Introductionmentioning

confidence: 99%

Heat Transfer, Phase Change, and Thermocapillary Flow in Films of Molten Metal on a Substrate

Ajaev¹,

Willis²

2006

Numerical Heat Transfer, Part A: Applications

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A mathematical model has been developed for heat transfer and fluid flow in thin films of molten metal during nanosecond pulsed laser irradiation. Heat conduction in the substrate is modeled using the finite-difference approach, while description of heat transfer and viscous flow in the film is based on the assumption of the large ratio of laser beam radius to film thickness and involves numerical solution of a partial differential equation for the thickness. The model includes the highly nonlinear dependence of evaporative flux on local interfacial temperature and positive disjoining pressure due to free electrons in the metal. Thermocapillary stresses which result from radially nonuniform heating are identified as the main mechanism of removal of liquid metal from the irradiated area. Characteristic times of the process, as well as shapes of the molten surface, agree with experimental observations.

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“…Laser etching has no use for photo-mask and the flexibility in patterning process. Dry process is also ecological technique without chemical contamination [1,2,3]. We examined the effects of wavelengths on processing ITO thin films using the first (?=1O47 nm), second Q=524 nm), third (X=349 nm) and fourth harmonic (?.=262 nm) of diode-pumped Nd: YLF laser.…”

Section: Introductionmentioning

confidence: 99%

“…A is removal area of ITO thin films. The relationship between laser fluence calculated by equation(1) and transmittance of substrate glass on which ITO thin films deposited. Thickness of the glass was 2.1mm.…”

mentioning

confidence: 99%

Effects of wavelengths on processing indium tin oxide thin films using diode-pumped Nd:YLF laser

et al. 2003

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In order to examine the dependence of ITO(Indium Tin Oxide) thin films on wavelengths of laser at ablation, the first, second, third and fourth harmonic of diode-pumped Nd:YLF laser were employed respectively. Patterning was performed successfully at any wavelength. The laser fluence was controlled by defocusing of beam. We made comparisons with each fluence for ablating ITO layer on substrate glass, and observed surface of the glass and edge of groove formed by laser etching. Near the groove, much debris was deposited. So we examined the effects of various sealed gases having different molecular weight (e.g. He, N2, Ar). The amount of debris was reduced by only He gas. Additionally we measured index of absorption by ITO and substrate glass for lights. The range for wavelengths was swept from ultraviolet to infrared. In conclusion, we recognized that the removal of ITO was more efficient with increase of absorption of lights.

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Maskless patterning of indium tin oxide layer for flat panel displays by diode-pumped Nd:YLF laser irradiation

Cited by 52 publications

References 3 publications

Micro machining of ITO film by LD-pumped SGH YAG laser

Micro machining of ITO film by LD-pumped SGH YAG laser

Heat Transfer, Phase Change, and Thermocapillary Flow in Films of Molten Metal on a Substrate

Effects of wavelengths on processing indium tin oxide thin films using diode-pumped Nd:YLF laser

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