RSC Adv.
 2020
DOI: 10.1039/d0ra02110e
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Mass spectrometric analysis of acid-assisted photochemical release of the trimethyl lock system on the monolayers on gold

Geunhyeok Yu
1
,
Woon‐Seok Yeo
2

Abstract: The acid-assisted photolysis of the trimethyl lock on the surface was characterized by mass spectrometry.

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