Mass spectrometric characterization of a 2,2‐bis[4‐(2,3‐epoxypropoxy)phenyl]propane‐aniline addition polymer and its telechelic prepolymers

Klee, Joachim E.; Hägele, Klaus; Przybylski, Michael

doi:10.1002/macp.1995.021960321

Cited by 10 publications

(13 citation statements)

References 14 publications

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“…Aniline was added in slight excess relative to the diglycidyl ether of bisphenol A with a molar ratio of 1.05 to 1, such that the synthesized polymer had amine groups at the terminal ends [15]. The AFP was dissolved in spectroscopic grade 1,4-dioxane and filtered through a 0.45 lm membrane.…”

Section: Methodsmentioning

confidence: 99%

“…For the case of a seven-bilayer assembly, the thickness value ranges between 120 and 150 nm. The average advancing contact angles of a plain surface and SRG on films of PDO3 with amine groups at terminal ends [15] were found to be 92°a nd 88°, respectively, using deionized (DI) water. These values are similar to reported values of hydrophobic bulk polystyrene.…”

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confidence: 99%

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Facile Patterning of Periodic Arrays of Metal Oxides

et al. 2006

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Highly ordered arrays of periodic nanostructures [1] show interesting characteristics for applications in photonics, [2] electronics, [3] optoelectronics, [4] sensing, [5] biochips, [6] and catalysis. [7] The array properties are determined by the choice of material and can be tuned further by varying the geometry, chemical composition, periodicity, and the size of the nanostructures. [4,8] Such controlled and elaborate arrays are commonly fabricated by X-ray or electron-beam lithography. However, there are limitations to patterning over large areas using these lithographical techniques due to long processing times, which result in higher costs. Relatively simple and costeffective nanopatterning processes have been developed to address these inherent limitations, including interference lithography, [9] nanosphere lithography, [10] and soft lithography. [11] In order to pattern metals or metal oxides, however, the non-conventional methods still require multistep processing as does conventional photoresist lithography. In this paper, we demonstrate a novel but simple methodology for the fabrication of periodic structures comprising metal oxides at the sub-100 nm scale using polymeric templates, colloids, and common laboratory equipment. Thus, this nanopatterning technique does not require high-vacuum deposition, etching, or photoresists, which are common in other processes. The patterns produced with this method were periodic and composed of 1D or 2D arrays of nanostructures over large areas. Fabrication of these metal oxide nanostructures required only a few hours once the nanometer-sized colloid of the metal oxide and polymeric templates were available. The structural resolution of the resulting pattern was determined by the amount of colloidal deposition onto the grooves (or grating) of the templates used. Although this process utilized microstructured templates, it is possible to fabricate features of metal oxide at the 100 nm scale. The geometry and periodicity of the structure can be well defined and controlled through selection from a wide variety of polymeric templates fabricated by numerous techniques. This unique strategy to achieve controlled nanopatterning can utilize a wide variety of inorganic colloids and/or intricate templates (or masks) available from various established lithographic methods. Microstructured polymeric templates have been prepared using a single-step holographic patterning process by exposing films of azobenzene-functionalized polymers (AFPs) on substrates to an argon-ion laser (488 nm) interference pattern. [12] The interference pattern produced photoinduced mass transfer in the polymer film giving rise to a surface-relief structure without additional processing.[13] Such surface modulation leads to 1D or 2D periodic arrays of surface-relief-grating (SRG) structures on the polymeric films. A variety of holographic surface structures can be designed and fabricated with good control over the modulation and periodicity of the patterns. In this work, SRG structures from thin films of ...

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Section: Methodsmentioning

confidence: 99%

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Facile Patterning of Periodic Arrays of Metal Oxides

et al. 2006

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“…It leads to high‐molecular‐weight linear‐addition polymers with molecular weights of 10–20 kD 12–15. As the step‐growth polymerization is always combined with the formation of cyclic oligomers,16 these cyclomers also were observed17, 18 in epoxide–amine addition polymers. The isolation of epoxide–amine cyclomers has been described some years ago.…”

Section: Introductionmentioning

confidence: 99%

Metal‐template synthesis of cyclic epoxide–amine oligomers: Uncrosslinked epoxide–amine addition polymers, 47

Klee¹,

Hägele²,

Przybylski³

2003

J. Polym. Sci. A Polym. Chem.

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The addition reaction of 2,2-bis-[4-(2,3-epoxypropoxy)-phenyl]-propane (DGEBA) and preformed complexes of metal ions and disecondary diamines led to a large quantity of cyclic epoxide-amine oligomers. As shown by gel permeation chromatographic analysis, cycles of n ϭ 1, 2, and 3 were formed. Functional epoxide end groups of the prepared oligomers were completely missing in the IR and 1 H NMR and 13 C NMR spectra. In the fast atom bombardment and matrix-assisted laser desorption/ ionization mass spectra, the molecular ions of the n ϭ 1, 2, 3 cycles of DGEBA and N,NЈ-dibenzyl-5-oxanonanediamine-1,9 were detected at m/z ϭ 680, 1361, and 2042.

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“…[7] Cyclic oligomers of 2,2-bis[4-(2,3-epoxypropoxy)phenyl]propane (DGEBA) and disecondary aromatic diamines have been synthesized in highly diluted solutions. [8] Small amounts of series of cyclic oligomers were also found in linear epoxide-amine addition polymers of DGEBA and primary monoamines, [9,10] which were separated by precipitation of addition polymers in acetone. [6,7] Some years ago the formation of cyclic oligomers of DGEBA and primary monoamines seemed to be impossible because of the assumed high ring tension.…”

Section: Introductionmentioning

confidence: 99%