2006
DOI: 10.1002/anie.200603142
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Massively Parallel Dip–Pen Nanolithography with 55 000‐Pen Two‐Dimensional Arrays

Abstract: Lots of writing on the wall: A simple and flexible approach for performing high‐throughput, large‐area, direct‐write molecular patterning, without tip feedback, is demonstrated by using a 55 000‐pen two‐dimensional array of atomic force microscope (AFM) cantilevers. The use of low‐aspect‐ratio pyramidal tips, curved cantilevers, and a novel gravity‐driven alignment method allows parallel patterning of molecules across 1‐cm2 substrate areas at sub‐100‐nm resolution.

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Cited by 300 publications
(217 citation statements)
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“…28 A massively parallel DPN technique has been introduced to fabricate multiplexed patterns of various molecules and high-throughput molecular prints. 29 In the patterning of lipid molecules, poly(diallydimethylammonium chloride) was used as the inking molecule in DPN to introduce diffusion barriers and bio-functionalization sites in the SLB. 30 After SLB formation, the resulting poly(diallydimethylammonium chloride) patterns provided a template for protein adsorption and the inhibition of lipid diffusion.…”
Section: Formation Of Lipid-nanostructure Hybrids and Their Structurementioning
confidence: 99%
“…28 A massively parallel DPN technique has been introduced to fabricate multiplexed patterns of various molecules and high-throughput molecular prints. 29 In the patterning of lipid molecules, poly(diallydimethylammonium chloride) was used as the inking molecule in DPN to introduce diffusion barriers and bio-functionalization sites in the SLB. 30 After SLB formation, the resulting poly(diallydimethylammonium chloride) patterns provided a template for protein adsorption and the inhibition of lipid diffusion.…”
Section: Formation Of Lipid-nanostructure Hybrids and Their Structurementioning
confidence: 99%
“…This problem has been addressed for scanning force microscopy (SFM) by the millipede [24] and parallel dip-pen nanolithography concepts. [25] Parallel electrode arrays have also been used with fixed arrangements of the individual electrodes but without lateral repositioning of the array. [26,27] The necessity of leveling samples relative to the horizontal (x,y) plane of the positioning system adds another technical difficulty that is especially evident for bent and rough samples.…”
mentioning
confidence: 99%
“…In order to compete with these techniques, it was necessary to increase the throughput of DPN by parallelizing the deposition process. The scalability of DPN was demonstrated by Salaita et al 51 who were able to fabricate a 55,000-pen 2D array generating 88 million Au dots (pitch distance 400 nm) with a diameter equal to 100 ± 20 nm ( See FIG. 3).…”
Section: Dip-pen Nanolithographymentioning
confidence: 99%