Mastering the resist-leaching and aqueous-contact-angle challenges

Wei, Yayi

doi:10.1117/2.1200705.0758

SPIE Newsroom

2007

DOI: 10.1117/2.1200705.0758

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Mastering the resist-leaching and aqueous-contact-angle challenges

Yayi Wei¹

Abstract: Water-related issues in 193nm immersion lithography require the development of hydrophobic coatings that resist leaching.

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Mastering the resist-leaching and aqueous-contact-angle challenges

Abstract: Water-related issues in 193nm immersion lithography require the development of hydrophobic coatings that resist leaching.

Cited by 0 publications

References 9 publications

No citations

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