2017
DOI: 10.1007/s00170-017-1098-z
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Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing

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Cited by 40 publications
(11 citation statements)
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“…It is more suitable as a catalyst for the Fenton reaction. The results of Liang et al (2018a) showed that for the MRCF of SiC, the contribution of the mechanical effect to the MRR is 68.22% to 91.42%, while that of the chemical effect to the MRR is only 3.74% to 26.22%, which is considerably less. The strength of the chemical action of the polishing solution on the substrate needs to be enhanced.…”
Section: Introductionmentioning
confidence: 92%
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“…It is more suitable as a catalyst for the Fenton reaction. The results of Liang et al (2018a) showed that for the MRCF of SiC, the contribution of the mechanical effect to the MRR is 68.22% to 91.42%, while that of the chemical effect to the MRR is only 3.74% to 26.22%, which is considerably less. The strength of the chemical action of the polishing solution on the substrate needs to be enhanced.…”
Section: Introductionmentioning
confidence: 92%
“…Subsequently, the generated SiO 2 oxide layer is stripped and removed via mechanical action and with the polishing solution. Finally, the ultra-precision processed surface of the substrate is obtained (Liang et al, 2018a).…”
Section: Mrcf Principle and Devicementioning
confidence: 99%
“…The combination of traditional MAF or MRF processes with other phenomena (e.g., electrochemical and ultrasonic ones) is another possible solution to improve MRR and potentially enhance finishing performance toward meeting industrial needs. The literature reports several hybrid applications with promising results [ 65 69 ]. Hybridization can help achieve the desired efficiency, but individual and interactive knowledge of the processes is one of the key elements.…”
Section: Trends For Future Research On Magnetic Field-assisted Finishingmentioning
confidence: 99%
“…The physical properties of the Si 3 N 4 ceramic balls obtained are listed in Table 1. Since the lack of information on the slurry component and quantities of CMRF in Si 3 N 4 ball polishing, The components and quantities of the slurry were selected based on the previous experimental results of our research group, which applied CMRF in polishing ceramic planes (SrTiO 3 and SiC) [16,17]. The magnetorheological slurry was made up with 400 mL polishing fluid and the mixed powders of 4% diamond abrasive grains (1 µm) and 16% hydroxyl iron powders (3 µm).…”
Section: Polishing Experimentsmentioning
confidence: 99%
“…The material removal rate was 0.154 µm/min and the final surface roughness was around 8 nm, which demonstrated a good processing efficiency and high quality on the surface finish. Liang et al [17] also applied CMRF for the polishing of SiC ceramic plane surfaces. Results showed that the final surface roughness was about 0.6 nm when the magnetorheological slurry consisting of carbonyl iron powders and H 2 O 2 was applied.…”
Section: Introductionmentioning
confidence: 99%