2006
DOI: 10.1016/s1369-7021(06)71387-6
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Materials chemistry for low-k materials

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Cited by 268 publications
(179 citation statements)
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“…Dielectric properties are correlated with electro-optic property of the materials. Microelectronics industry needs low dielectric constant (e r ) materials as an interlayer dielectric (Hatton et al 2006). The dielectric constant is calculated using the formula,…”
Section: Dielectric Studiesmentioning
confidence: 99%
“…Dielectric properties are correlated with electro-optic property of the materials. Microelectronics industry needs low dielectric constant (e r ) materials as an interlayer dielectric (Hatton et al 2006). The dielectric constant is calculated using the formula,…”
Section: Dielectric Studiesmentioning
confidence: 99%
“…Microelectronics industry needs low dielectric constant (εr) materials as an interlayer dielectric [17] The dielectric constant is calculated using the formula res5 (a), 5(b) show the variation of dielectric constant and dielectric loss with respect to frequency for all temperatures of L-Serine doped KDP crystals. Compared to the pure KDP, dielectric constant (εr ) value is found to be low for doped KDP [18].…”
Section: Dielectric Studymentioning
confidence: 99%
“…For simple metal-oxide semiconductor field effect transistors (MOSFET), the low-k materials should be structurally uniform, have low dielectric constant (k * 2), low dielectric loss, high hardness, high adhesion strength, thermal stability, and low moisture absorption [7]. Because of the network structure in organically modified silica melting gels, the structural uniformity and hardness can be achieved.…”
Section: Property Requirements For Low K Materials In Integrated Circmentioning
confidence: 99%