Maximizing domain-wall speed via magnetic anisotropy adjustment in Pt/Co/Pt films

Abstract

We report an experimental observation that indicates that a direct relation exists between the speed of the magnetic domain-wall (DW) motion and the magnitude of the perpendicular magnetic anisotropy (PMA) in Pt/Co/Pt films. It is found that by changing the thicknesses of the nonmagnetic Pt layers, the PMA magnitude can be varied significantly and the field-driven DW speed can also be modified by a factor of up to 50 under the same magnetic field. Interestingly, the DW speed exhibits a clear scaling behavior with respect to the PMA magnitude. A theory based on the DW creep criticality successfully explains the observed scaling exponent between the DW speed and the PMA magnitude. The presented results offer a method of maximizing the DW speed in DW-mediated nanodevices without altering the thickness of the magnetic Co layer.

Asymmetric magnetic bubble expansion under in-plane field in Pt/Co/Pt: Effect of interface engineering

“…The scaling constant χ , scales with H K,eff , which is plotted in red in Fig. 2(d) K,eff can be obtained [25]. In the right inset of Fig.…”

Wide-Range Probing of Dzyaloshinskii–Moriya Interaction

“…With this scheme, the magnitude of H 0 can be adjusted down to a small experimental range H range of the external magnetic field, which allows one to measure a large H DMI without upgrading the electromagnet. For example, by tilting the DWs up to about 80°, one can measure H DMI up to 1 T using an electromagnet with H range ~ 200 mT, which is easily achieved in conventional optical setups 23 . It is also worth noting that by using this approach we can prevent a number of artifacts caused by large magnetic fields, such as mechanical instability produced by the induced magnetic moment in the optical setup, magneto-optical effects in the objective lens, and large Joule heating caused by the huge currents passing through the electromagnet.…”

“…For this study, we prepared 5.0-nm Ta/3.0-nm Pt/0.6-nm Co/1.6-nm AlO x and 5.0-nm Ta/3.0-nm Pt/0.6-nm Co/2.0-nm MgO films, which were deposited on a Si wafer with a 100 nm SiO 2 layer by dc magnetron sputtering 23 . To enhance the sharpness of the layer interfaces, we set a small deposition rate (=0.25 Å/s) through adjustment of the Ar sputtering pressure (~2 mTorr) and power (~10 W).…”

Magnetic bubblecade memory based on chiral domain walls

“…Furthermore, the two-dimensional bubblecade operation on unpatterned films enhances the compatibility toward the three-dimensional data storage by stacking the films. For better scalability, the stray-field-induced crosstalk and the size-dependence of the bubblecade speed have to be further investigated by exploring the proper materials and layer combination 31 including the antiferromagnetically coupled layer structures.…”