Measurement and simulation of impinging precursor molecule distribution in focused particle beam deposition/etch systems

Utke, Ivo; Friedli, Vinzenz; Amorosi, Simone; Michler, Johann; Hoffmann, P.

doi:10.1016/j.mee.2006.01.136

Cited by 26 publications

(21 citation statements)

References 13 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…51͑b͔͒. 186 Some reports mention the existence of a minimum gas pressure required for deposition. A pressure threshold of 8.6ϫ 10 −4 Pa was found for deposition from CrO 2 Cl 2 .…”

Section: Precursor Pressurementioning

confidence: 99%

A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

486

577

View full text Add to dashboard Cite

An extensive review is given of the results from literature on electron beam induced deposition. Electron beam induced deposition is a complex process, where many and often mutually dependent factors are involved. The process has been studied by many over many years in many different experimental setups, so it is not surprising that there is a great variety of experimental results. To come to a better understanding of the process, it is important to see to which extent the experimental results are consistent with each other and with the existing model. All results from literature were categorized by sorting the data according to the specific parameter that was varied ͑current density, acceleration voltage, scan patterns, etc.͒. Each of these parameters can have an effect on the final deposit properties, such as the physical dimensions, the composition, the morphology, or the conductivity. For each parameter-property combination, the available data are discussed and ͑as far as possible͒ interpreted. By combining models for electron scattering in a solid, two different growth regimes, and electron beam induced heating, the majority of the experimental results were explained qualitatively. This indicates that the physical processes are well understood, although quantitatively speaking the models can still be improved. The review makes clear that several major issues remain. One issue encountered when interpreting results from literature is the lack of data. Often, important parameters ͑such as the local precursor pressure͒ are not reported, which can complicate interpretation of the results. Another issue is the fact that the cross section for electron induced dissociation is unknown. In a number of cases, a correlation between the vertical growth rate and the secondary electron yield was found, which suggests that the secondary electrons dominate the dissociation rather than the primary electrons. Conclusive evidence for this hypothesis has not been found. Finally, there is a limited understanding of the mechanism of electron induced precursor dissociation. In many cases, the deposit composition is not directly dependent on the stoichiometric composition of the precursor and the electron induced decomposition paths can be very different from those expected from calculations or thermal decomposition. The dissociation mechanism is one of the key factors determining the purity of the deposits and a better understanding of this process will help develop electron beam induced deposition into a viable nanofabrication technique.

show abstract

“…51͑b͔͒. 186 Some reports mention the existence of a minimum gas pressure required for deposition. A pressure threshold of 8.6ϫ 10 −4 Pa was found for deposition from CrO 2 Cl 2 .…”

Section: Precursor Pressurementioning

confidence: 99%

A critical literature review of focused electron beam induced deposition

Dorp

Hagen

2008

Journal of Applied Physics

486

577

View full text Add to dashboard Cite

show abstract

“…The authors themselves admit there is a discrepancy here but give no satisfying explanation or Solid Pd core (few concrete details) [94] hypothesis. Interestingly when one peruses the rest of the literature on this precursor [20,27,49,[96][97][98][99], the resistivity measurement has apparently only been repeated once, by Luisier et al [22]. They found that the material (containing 20 at.% Cu) was electrically insulating, a finding which questions the results obtained in [95].…”

Section: Other Precursorsmentioning

confidence: 99%

Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

Mulders²,

2009

View full text Add to dashboard Cite

The creation of functional nanostructures by electron-beam-induced deposition (EBID) is becoming more widespread. The benefits of the technology include fast 'point-and-shoot' creation of three-dimensional nanostructures at predefined locations directly within a scanning electron microscope. One significant drawback to date has been the low purity level of the deposition. This has two independent causes: (1) partial or incomplete decomposition of the precursor molecule and (2) contamination from the residual chamber gas. This frequently limits the functionality of the structure, hence it is desirable to improve the decomposition and prevent the inclusion of contaminants. In this contribution we review and compare for the first time all the techniques specifically aimed at purifying the as-deposited impure EBID structures. Despite incomplete and scattered data, we observe some general trends: application of heat (during or after deposition) is usually beneficial to some extent; working in a favorable residual gas (ultra-high vacuum set-ups or plasma cleaning the chamber) is highly recommended; gas mixing approaches are extremely variable and not always reproducible between research groups; and carbon-free precursors are promising but tend to result in oxygen being the contaminant species rather than carbon. Finally we highlight a few novel approaches.

show abstract

“…Either a capillary is positioned near the electron beam impact point at the substrate surface, and used to inject the gas into a chamber that is pumped continuously using a high vacuum pumping system [39,40]. Alternatively, the entire vacuum chamber, or a subchamber [18] is filled with a precursor gas, as is done in environmental electron microscopy [41][42][43][44].…”

Section: Mechanismsmentioning

confidence: 99%

“…In recent years, the basic model defined by Eqns. 1-2 has been used (or modified) to account for the following phenomena: -The gas pressure distribution inside the electron microscope specimen chamber [39,40,56,57], which governs the gas molecule flux F (x, y) across the substrate surface. The precursor pressure can vary substantially across the surface region irradiated by the electron beam, particularly when the precursor gas is delivered into the vacuum chamber using a capillary located near the beam impact point at the surface.…”

Section: Mechanismsmentioning

confidence: 99%

Advances in gas-mediated electron beam-induced etching and related material processing techniques

Toth

2014

Appl. Phys. A

View full text Add to dashboard Cite

Electron beam induced etching (EBIE) has traditionally been used for top-down, direct-write, chemical dry etching and iterative editing of materials. The present article reviews recent advances in EBIE modeling and emerging applications, with an emphasis on use cases in which the approaches that have conventionally been used to realize EBIE are instead used for material analysis, surface functionalization, or bottom-up growth of nanostructured materials. Such applications are used to highlight the shortcomings of existing quantitative EBIE models, and to identify physico-chemical phenomena that must be accounted for in order to enable full exploitation and predictive modeling of EBIE and related electron beam fabrication techniques.

show abstract

Measurement and simulation of impinging precursor molecule distribution in focused particle beam deposition/etch systems

Cited by 26 publications

References 13 publications

A critical literature review of focused electron beam induced deposition

A critical literature review of focused electron beam induced deposition

Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

Advances in gas-mediated electron beam-induced etching and related material processing techniques

Contact Info

Product

Resources

About