2015 IEEE/SICE International Symposium on System Integration (SII) 2015
DOI: 10.1109/sii.2015.7405155
|View full text |Cite
|
Sign up to set email alerts
|

Measurement of MWCNT/Tungsten contact resistance by bridging CNT on two tungsten electrodes with two manipulators

Abstract: Semiconductor nano-devices based on carbon nanotubes (CNTs) have attracted great interests recently such as field effect transistors (CNTFETs). One of the challenges is to reduce the contact resistance between CNT and electrodes. This paper presents a robotic system with two nano-manipulators for two-lead contact resistance measurement. Electron beam induced deposition (EBID) technique was applied to decrease the contact resistance between multi-walled CNTs (MWCNTs) and Tungsten deposition fabricated by focuse… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
references
References 15 publications
0
0
0
Order By: Relevance