Measurement of secondary electron emission yields

Abstract

The authors describe a method for the measurement of secondary electron emission coefficients and demonstrate the use of this approach for the measurement of secondary electron yields for titanium, copper, and carbon ions incident upon an aluminum target. The method is time-resolved in that a series of measurements can be obtained within a single ion beam pulse of several hundred microseconds duration. The metal ion beams were produced with a vacuum arc ion source, and the ratio of secondary electron current to incident ion current was determined using a Faraday cup with fast control of the electron suppressor voltage. The method is relatively simple and readily applied and is suitable for measurements over a wide parameter range. The secondary yields obtained in the present work are of relevance to the measurement of ion current and implantation dose in plasma immersion ion implantation.Index Terms-Ion beam bombardment, ion beams, secondary electron yield, secondary emission, vacuum arc ion source, vacuum arc plasma.

Secondary electron emission measurements of dielectric window materials

“…5(b) showed the secondary current collected by continuous two electron beams, and it was clear that the second current became lower. SEE δ was calculated [7,[10][11][12][13] approximately 30 mm in diameter and 6 mm thick. Samples were cleaned with the ethyl alcohol prior to placement into the vacuum chamber and mechanical polished, eliminating surface roughness effect.…”

“…As an important component of high power microwave (HPM) generation device, the dielectric window made of Alumina ceramics (i.e. inorganic materials) is widely used [5,7,[10][11][12][13], because of its excellent characteristics, such as tolerance under high temperature condition, high mechanical strength, high resistivity, small microwave losses and so on. Tolerance under high temperature condition is helpful to reduce the thermal effect of HPM; high mechanical strength stand the pressure between vacuum and air; small microwave loss is beneficial to transmission of HPM.…”

The New Model Based on Secondary Electron Emission of Solid Materials on Its Electrostatic Electrification

“…Based on the secondary electron flow Is and the number of primary electron stream Ip [6] , there is the Eq. (1):…”

Electrostatic energy analyzer measurements of low energy zirconium beam parameters in a plasma sputter-type negative ion source

“…21 The relative decrease in current as the flow rate is increased is due to the space charge compensation within the path of the ion beam. 22,23 The ESA plot using the semi-cylindrical FC is shown in Figure 3(b) under the same experimental parameters except discharge voltage at 30 V to maintain the discharge current at 1 A. There is a reduction in the current reading to about an order of magnitude due to the lower discharge voltage and selective capability of the FC allowing only particles along the beam axis to pass.…”