1985
DOI: 10.1116/1.573326
|View full text |Cite
|
Sign up to set email alerts
|

Measurement of semiconductor heterojunction band discontinuities by x-ray photoemission spectroscopy

Abstract: Accurate knowledge of the band discontinuities at a heterojunction interface and the factors that affect their magnitude are of both fundamental and practical interest. The application of x-ray photoemission spectroscopy (XPS) to the direct, contactless, and quantitative measurement of the valence band discontinuity (ΔEv) at abrupt heterojunctions is discussed. The topics covered include a description of a method to achieve precise measurement, results of ΔEv measurements for many heterojunction pairs selected… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
80
0

Year Published

2004
2004
2019
2019

Publication Types

Select...
7
2

Relationship

0
9

Authors

Journals

citations
Cited by 136 publications
(80 citation statements)
references
References 0 publications
0
80
0
Order By: Relevance
“…These are derived from the core level binding energies by subtracting the binding energy difference of the PZT core levels with respect to the PZT valence band maximum of the uncovered substrates. The core level to valence band maximum binding energy difference is constant for a material and should not change during metal deposition if no strong chemical disruption of the substrate occurs [43,44,45]. The PZTrelated core level emissions, including the oxidic Pb +II 4f component, exhibit parallel shifts during metal deposition for all three interfaces as evident from Figure 3(a-c).…”
Section: Resultsmentioning
confidence: 71%
“…These are derived from the core level binding energies by subtracting the binding energy difference of the PZT core levels with respect to the PZT valence band maximum of the uncovered substrates. The core level to valence band maximum binding energy difference is constant for a material and should not change during metal deposition if no strong chemical disruption of the substrate occurs [43,44,45]. The PZTrelated core level emissions, including the oxidic Pb +II 4f component, exhibit parallel shifts during metal deposition for all three interfaces as evident from Figure 3(a-c).…”
Section: Resultsmentioning
confidence: 71%
“…The vast majority of the heterovalent interfaces presently studied tends to relax with a slight expansion in the overall length, with shifts in individual positions specific to the atomic species at the interface. The VBOs of the relaxed heterovalent interfaces are summarized in Table 2 and compared with experimental results, [54][55][56][57][58][59][60][61][62][63][64][65][66] where available. Results calculated for several heterojunctions between lattice-matched II-VI and group IV semiconductors are also included in Table 2 and can be seen to approximately display the same systematic trend as observed for III-V/IV and II-VI/III-V heterojunctions.…”
Section: Charge Transfer Considerations At Relaxed "Neutral" Interfacesmentioning
confidence: 99%
“…23 The binding energy differences ΔE CL,VB , which are material constants, are used below to derive the energy band alignment from the interface experiments using the Kraut method. 18 The large disparity of binding energy differences has been observed not only for the polycrystalline anatase and single-crystalline rutile samples but also for a number of other samples of the two modifications in poly-and single-crystalline structure (see Figure S2 in the Supporting Information). The ΔE CL,VB are in good agreement with our electronic structure calculations (see Figure 3 and the Supporting Information).…”
mentioning
confidence: 95%