Measurement of Stark Halfwidths of Spectral Lines of Ionized Oxygen and Silicon Emitted from T-tube Plasma

Abstract

The analysis of experimental Stark halfwidths of spectral lines of singly ionized oxygen and silicon and double ionized silicon is presented in this work. The considered spectral lines were emitted from plasma generated in an electromagnetically driven T-tube, with an electron temperature of 15,000 K and electron density of 1.45 × 1023 m−3. The obtained Stark halfwidths were compared to experimental values given by other authors. In addition, all experimental values were compared to theoretical values. These data are useful for diagnostics of laboratory and astrophysical plasmas as well as verifying theoretical models.