Mechanical and electrochemical characterization of vanadium nitride (VN) thin films

Caicedo, J.C.; Zambrano, G.; Aperador, W.; Escobar-Alarcón, L.; Camps, E.

doi:10.1016/j.apsusc.2011.08.057

Cited by 114 publications

(64 citation statements)

References 33 publications

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“…61 However, a lower lattice parameter has already been reported for VN thin films prepared by D.C. sputtering and could be explained by a compressive stress related to the deposition conditions. 62,63 Representative SEM images of VN thin films are shown in Figure 2. The VN film exhibits columnar growth on the glass substrate ( Figure 2a) with an average column diameter of 20 nm (Figure 2b).…”

Section: Resultsmentioning

confidence: 99%

Suitable Conditions for the Use of Vanadium Nitride as an Electrode for Electrochemical Capacitor

Morel

Borjon-Piron

Porto

et al. 2016

J. Electrochem. Soc.

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Vanadium nitride has displayed many interesting characteristics for its use as a pseudocapacitive electrode in an electrochemical capacitor, such as good electronic conductivity, good thermal stability, high density and high specific capacitance. Thin films of VN were prepared by D.C. reactive magnetron sputtering. The electrochemical stability of the films as well as the influence of dissolved oxygen in 1 M KOH electrolyte were investigated. In order to avoid material as well as electrolyte degradation, it was concluded that vanadium nitride should only be cycled between −0.4 and −1.0 V vs. Hg/HgO. After a 24 hours stabilization period, the prepared VN thin film showed an initial capacitance of 19 mF.cm −2 and a capacity retention of 96% after 10000 cycles. Furthermore, dissolved oxygen in the electrolyte was demonstrated to cause self-discharge up to a potential above −0.4 V vs. Hg/HgO, where VN was shown to be unstable. Additionally, the presence of oxygen was shown to shift the open circuit potential of a VN electrode to about 0 V through self-discharge processes. Electrochemical capacitors are currently being developed to complement other energy storage or conversion systems such as batteries and fuel cells. In the past two decades, several electrode materials have been investigated. The mostly studied materials include carbons, 1-8 conducting polymers 9-12 as well as pseudocapacitive 13 transition metal oxides such as ruthenium dioxide 14-18 and manganese dioxide. [19][20][21][22][23][24] In the effort to improve the performance of electrochemical capacitors, a widely used approach has been to develop synthetic methods to develop nanomaterials that are believed to lead to increased energy density and higher rate capability. 14,23,[25][26][27][28] Another approach has been to investigate the charge storage properties of novel materials. Accordingly, several research groups considered materials such as MXenes 29,30 and transition metal nitrides. [31][32][33][34][35][36][37] In the latter class of compounds, molybdenum nitride was firstly investigated 32,33,35,38,39 and in the past decade a great deal of attention has focused on other nitrides with an intensive focus on vanadium nitride 37,40-58 as a consequence of the impressive capacitance of 1340 F.g −1 reported for nanosized VN particles in 1 M KOH. 58 Indeed, VN is an interesting electrode material due to this high reported specific capacitance coupled with its close to metallic electronic conductivity (1.18 S.m −1 ), 59 high density (6.13 g.cm −3 ) and high melting point (2619 K). 59The hypothesis proposed by Choi et al.58 to explain such a high specific capacitance of VN, is that, in addition to electrochemical double layer capacitance, successive fast reversible redox reactions are taking place, involving surface oxide groups and OH − ions from the electrolyte. This hypothesis was supported by the observation of surface oxide via ex-situ XPS 58 and FTIR 41,58 post cycling measurements.While most studies concentrated on new synthesis of VN with the goa...

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Section: Resultsmentioning

confidence: 99%

Suitable Conditions for the Use of Vanadium Nitride as an Electrode for Electrochemical Capacitor

Morel

Borjon-Piron

Porto

et al. 2016

J. Electrochem. Soc.

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“…From the AFM analysis, it was obtained a grain size of 302 AE 8 nm and roughness of 87 AE 2 nm. Take in account the AFM image and grain size with roughness values, is possible to establish that Ar þ -ion bombardment generated by the application of negative bias causes a growth of elongated grains with discontinuous columnar structure with formation of pores on 8YSZ material due to high Ar þ impact [33]. Although the values reported follow the usual tendency of films grown under a substrate bias voltage, the 8YSZ films presented in this research have exhibit a larger grain size than films obtained in previous similar works deposited at lower temperatures [12,16,20].…”

Section: Microstructure Analysismentioning

confidence: 99%

A non-destructive method for determination of thermal conductivity of YSZ coatings deposited on Si substrates

Amaya

Caicedo

Yáñez‐Limón

et al. 2012

Materials Chemistry and Physics

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“…The hardness HN, reduced Young's modulus Er and H 3 /E 2 ratio of treated and untreated samples are given in Table 2. The plastic deformation resistance (H 3 /E 2 ratio) is an indicator of a resistance to plastic deformation of the coating and a relationship between the hardness HN and the reduced Young's modulus Er [14][15]. The wear resistance relates to the high hardness HN and the reduced Young's modulus Er [16].…”

Section: Surface Image Analysismentioning

confidence: 99%

Modifications of surface properties of beta Ti by laser gas diffusion nitriding

Chan

Man

et al. 2016

Journal of Laser Applications

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Abstractβ -type Ti-alloy is a promising biomedical implant material as it has a low Young's modulus but is also known to have inferior surface hardness. Various surface treatments can be applied to enhance the surface hardness. Physical vapour deposition (PVD) and chemical vapour deposition (CVD) are two examples of this but these techniques have limitations such as poor interfacial adhesion and high distortion. Laser surface treatment is a relatively new surface modification method to enhance the surface hardness but its application is still not accepted by the industry. The major problem of this process involves surface melting which results in higher surface roughness after the laser surface treatment. This paper will report the results achieved by a 100 W CW fiber laser for laser surface treatment without the surface being melted. Laser processing parameters were carefully selected so that the surface could be treated without surface melting and thus the surface finish of the component could be maintained. The surface and microstructural characteristics of the treated samples were examined using X-ray diffractometry (XRD), optical microscopy (OM), 3-D surface profile & contact angle measurements and nano-indentation test.

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Mechanical and electrochemical characterization of vanadium nitride (VN) thin films

Cited by 114 publications

References 33 publications

Suitable Conditions for the Use of Vanadium Nitride as an Electrode for Electrochemical Capacitor

Suitable Conditions for the Use of Vanadium Nitride as an Electrode for Electrochemical Capacitor

A non-destructive method for determination of thermal conductivity of YSZ coatings deposited on Si substrates

Modifications of surface properties of beta Ti by laser gas diffusion nitriding

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