In
this article, the limits of thin-film deposition on very rough
topographies are demonstrated by depositing alumina on vertically
aligned carbon nanotubes (VACNTs). Vapor deposition techniques are
the enabling platforms of the thin-film industry, offering high material
versatility and good coverage ability on relatively flat surfaces,
leading to frequent use in a large array of applications, especially
nanoscale electronic devices such as sensors and electrodes. However,
when surface topography exhibits high roughness, even depositions
that are not limited to line-of-sight show only partial coverage,
significantly hindering performances. Our manufacturing process of
VACNT/Al2O3 nanocomposites has three vaporous
steps: CNT growth by chemical vapor deposition (CVD), functionalization
via controlled thermal oxidation, and atomic layer deposition (ALD)
of alumina. The same limited accessibility hinders each of these three
steps. Morphological analyses show different CNT heights throughout
the sample, with shorter CNTs in the middle, having less access to
gases. As height differences between the center and peripheries escalate,
sample centers may collapse under the tension. The limited accessibility
of the center is manifested also in inhomogeneous oxygen contents,
between sample centers and peripheries. Finally, a sharp transition
in deposition quality occurs during the deposition process of Al2O3, from homogeneous to inconsistent, which is
also linked to the accessibility differences between. Adjusting process
parameters, we have successfully coated 1.8 mm-tall VACNT arrays with
a homogeneous thin (few nm) Al2O3 layer and
were able to increase the depth at which, thick (few dozens of nm)
Al2O3 coating is uniform from 20 to 350 μm.
However, when VACNTs were functionalized, the penetration depth was
found to correlate negatively with center oxygen content. These results,
indicating diffusion as a rate-setting step in complex topography
coatings, can significantly improve deposition quality and enhance
the performance of thin-film applications such as membranes, sensors,
and electrodes for energy harvesting and storage.