Mechanical and tribological properties of tungsten carbide sputtered coatings

Esteve, J.; Zambrano, G.; Rincon, Christopher; Martínez, E.; Galindo, H.; Prieto, P.

doi:10.1016/s0040-6090(00)01108-1

Cited by 58 publications

(38 citation statements)

References 7 publications

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“…The different methods are used for tungsten carbide deposition; PVD, CVD, hybrid method as well as thermal spraying methods . Same investigations indicated the dependence of WC coatings on the PVD deposition parameters, for example gas composition or sputtering time [4]. This results proof that the deposition parameters can strongly influence on the microstructure, composition and properties of coatings.…”

Section: Introductionsupporting

confidence: 54%

“…The mixture of Co and C particles was typical microstructure in this analysed coating. Results presented in the work [4] shown appearance of the WC carbide coating deposited in argon gases onto carbon steel substrates. Therefore it is difficult to recognized the reason of the unsuccessful deposition of WC carbides from WC-Co compacted powder evaporated in argon in the performed work.…”

Section: Discussionmentioning

confidence: 84%

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The Deposition of Wc-CO Coatings by EBPVD Technique

Richert¹,

Mazurkiewicz²,

Smolik³

2012

Archives of Metallurgy and Materials

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The WC-Co carbides are widely used to deposit protective coatings on engineering surfaces against abrasion, erosion and other forms of wear existence. The nanostructure coatings offer high strength, a low friction coefficient and chemical and thermal stability. WCo coatings were deposited using EBPVD technique realized in original technological process implemented in the hybrid multisource device, produced in the Institute for Sustainable Technologies -National Research Institute in Radom (Poland). The different kind of precursor sources was used. Depending on the source of precursors nanostructure of coatings forms continuous film or consist from nano-carbides. Nanocrystalline WC-Co coatings show hardness in the range of 510-1266 HV. The microstructure of coatings were observed by transmission electron microscopy (TEM). The phase consistence were determined byBrucker D8 Discover-Advance Diffractometer. The paper presents the original technological equipment, methodology, and technological parameters for the creation of the nanocomposite coatings WC.Keywords: electron beam evaporation, WC-Co coatings, microstructureWęgliki WC-Co są szeroko używane do osadzania na powierzchniach inżynierskich jako ochrona przeciwko tarciu, erozji i innym formom zużycia. Powłoki nanostrukturalne wykazują wysoką wytrzymałość, niski współczynnik tarcia oraz chemiczną i termiczną stabiność. Powłoki WC-Co zostały osadzane techniką EBPVD przy użyciu oryginalnego technologicznego procesu zhybrydowym źródłem prekursorów, w Instytucie Technologii Eksploatacji w Radomiu (Polska). Użyto różnego rodzaju źró-deł prekursorów. W zależności od rodzaju użytego źródła prekursorów nanostrukturalne powłoki były zbudowane z ciągłych warstw lub z nano-węglików. Mikrotwardość nanokrystalicznych powłok mieściła się w zakresie 510-1266 µHV. Mikrostruktura powłok była obserwowana transmisyjnym mikroskopem elektronowym (TEM). Skład fazowy powłok określono za pomocą aparatu rentgenowskiego Brucker D8 Discover-Advance Diffractometer. Artykuł prezentuje oryginalne technologiczne urządzenie, metodologię i technologiczne parametry pozwalające na wytworzenie nanokompozytowej powłoki WC.

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Section: Introductionsupporting

confidence: 54%

Section: Discussionmentioning

confidence: 84%

The Deposition of Wc-CO Coatings by EBPVD Technique

Richert¹,

Mazurkiewicz²,

Smolik³

2012

Archives of Metallurgy and Materials

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“…Tungsten carbide (WC) is a very attractive refractory material for industrial applications of thin hard layers to steel [1][2][3][4][5][6][7][8][9][10][11][12] and Al alloys. WC has an excellent combination of properties, such as high hardness, a high Young's modulus, and a low COF.…”

Section: Introductionmentioning

confidence: 99%

“…It is these characteristics of WC which improve the other properties of materials [13]. WC layers have been deposited using chemical vapor deposition (CVD) [14][15][16][17][18][19][20][21][22] and physical vapor deposition (PVD) techniques [1][2][3][4][5][6][7][8][9][10][11][12][13][23][24][25][26][27][28][29][30][31]. Plasma enhanced CVD of tungsten hexacarbonyl has also been used for the deposition of WC/C layers at lower temperatures compared to those used in CVD techniques [15][16][17][18][19][20][21].…”

Section: Introductionmentioning

confidence: 99%

“…WC creates β-W 2 C [7,24] and β-WC 1-x [7,24,29] phases where the individual forms of C and WC have different indentation of hardness (H), indentation modulus (E) and COF. Various factors which influence the formation of both phases are as follows: the deposited substrate surface temperature [3,8,11,12,23]; applied pressure and bias voltage [4,24,27,28]; content of carbon in the layers [1,6,8,23]; the flow rate and composition of the precursor [3,4,6,29], and residual stress in the layers [26]. Monocrystalline Si substrate is used to test structural properties under laboratory conditions [27][28][29][30].…”

Section: Introductionmentioning

confidence: 99%

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THE EFFECT OF PRESSURE, BIAS VOLTAGE AND ANNEALING TEMPERATURE ON N₂ AND N₂+SiH₄ DOPED WC/C DC MAGNETRON SPUTTERED LAYERS

Horňák¹

2018

Ceramics - Silikaty

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Thin Film Formation Techniques

Rumaiz¹,

Franklin²,

Buzby³

et al. 2006

Kirk-Othmer Encyclopedia of Chemical Technology

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A thin film is a surface layer with thickness of a few micrometers. These films have properties much different than that of bulk materials or that of the substrate on which the film is deposited. There are a variety of techniques for thin‐film deposition, generally referred to as vapor deposition processes. Depending on the source of the vapors to be deposited, vapor deposition process can be classified as physical vapor deposition (PVD) or chemical vapor deposition (CVD). Among the two, PVD technique is more widely used for thin‐film formation. Here, vapors are produced using resistive heating, atomic sputtering, ion plating, magnetron sputtering or lasers, alone or in combination with each other. Most of the PVD processes require a high vacuum. In CVD technique, vapors are obtained from gas, liquid, or solid precursors and involve a chemical reaction for the film formation.

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Mechanical and tribological properties of tungsten carbide sputtered coatings

Cited by 58 publications

References 7 publications

The Deposition of Wc-CO Coatings by EBPVD Technique

The Deposition of Wc-CO Coatings by EBPVD Technique

THE EFFECT OF PRESSURE, BIAS VOLTAGE AND ANNEALING TEMPERATURE ON N₂ AND N₂+SiH₄ DOPED WC/C DC MAGNETRON SPUTTERED LAYERS

Thin Film Formation Techniques

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