2015
DOI: 10.1016/j.surfcoat.2015.07.069
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Mechanical characterization of segment-structured hydrogen-free a-C films fabricated by filtered cathodic vacuum arc method

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Cited by 9 publications
(3 citation statements)
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“…Amorphous carbon films containing DLC films are synthesized by various methods such as chemical vapor deposition (CVD), which includes plasma-enhanced CVD [ 21 , 22 , 23 , 24 , 25 , 26 , 27 , 28 , 29 ], electron cyclotron resonance (ECR) plasma CVD [ 30 ], plasma-based ion implantation and deposition (PBII&D) [ 31 , 32 ], and physical vapor deposition, which includes ionized evaporation [ 33 ], sputtering [ 34 , 35 ], unbalanced magnetron sputtering (UBMS) [ 36 , 37 ], ECR sputtering [ 38 , 39 ], high-power impulse magnetron sputtering (HiPIMS) [ 40 , 41 ], filtered cathodic vacuum arc (FCVA) [ 42 , 43 , 44 , 45 ], ion-beam deposition (IBD) [ 5 , 46 , 47 , 48 ], arc ion plating (AIP) [ 49 , 50 ], pulsed laser deposition (PLD) [ 51 ], and laser arc deposition [ 52 , 53 ]. Many of the DLC films produced by these methods have deviated from the DLC regions on the ternary diagrams reported to date.…”
Section: Introductionmentioning
confidence: 99%
“…Amorphous carbon films containing DLC films are synthesized by various methods such as chemical vapor deposition (CVD), which includes plasma-enhanced CVD [ 21 , 22 , 23 , 24 , 25 , 26 , 27 , 28 , 29 ], electron cyclotron resonance (ECR) plasma CVD [ 30 ], plasma-based ion implantation and deposition (PBII&D) [ 31 , 32 ], and physical vapor deposition, which includes ionized evaporation [ 33 ], sputtering [ 34 , 35 ], unbalanced magnetron sputtering (UBMS) [ 36 , 37 ], ECR sputtering [ 38 , 39 ], high-power impulse magnetron sputtering (HiPIMS) [ 40 , 41 ], filtered cathodic vacuum arc (FCVA) [ 42 , 43 , 44 , 45 ], ion-beam deposition (IBD) [ 5 , 46 , 47 , 48 ], arc ion plating (AIP) [ 49 , 50 ], pulsed laser deposition (PLD) [ 51 ], and laser arc deposition [ 52 , 53 ]. Many of the DLC films produced by these methods have deviated from the DLC regions on the ternary diagrams reported to date.…”
Section: Introductionmentioning
confidence: 99%
“…30) Four DLC films were made using the filtered cathodic vacuum arc (FCVA) method. 31) A graphite cathode with a purity of 99.99% was used to generate carbon plasma. The deposition technique is described elsewhere.…”
Section: Methodsmentioning
confidence: 99%
“…Shahira Liza Kamis ve ark. [57], çalışmalarında silikon ve SUS403 substratları üzerinde biriktirilen segment yapılı hidrojen içermeyen -C filmlerin mekanik ve tribolojik davranışları incelenmiştir ve yapılandırılmış hidrojen içermeyen -C filmleri ile karşılaştırılmıştır. Yapılandırılmış hidrojen içermeyen -C filmleri, filtreli katodik vakum ark (FCVA) sistemi ile metal kafesler kullanılarak imal edilmiştir.…”
Section: Tri̇boloji̇ İle İlgi̇li̇ Yapilmiş Olan çAlişmalarunclassified