Mechanical properties, bonding characteristics, and oxidation behaviors of Nb–Si–N coatings

Chen, Yung-I; Gao, Yuxiang; Chang, Li-Chun; Ke, Yi-En; Liu, Bowei

doi:10.1016/j.surfcoat.2018.04.042

Cited by 17 publications

(3 citation statements)

References 42 publications

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“…In the interior region, the N 1s of Hf 32 Si 19 N 49 coatings comprised two signals of 396.49 ± 0.06 and 397.17 ± 0.06 eV (Figure 10a), which respectively fitted the binding energies of N-Hf and N-Si bonds. The Si 2p (Figure 10b) comprised two signals of 98.40 ± 0.06 and 100.87 ± 0.04 eV for the free Si (un-nitrified Si [37]) and Si-N bonds [38] in the interior region, respectively. The Hf 4f signals consisted of Hf 4 N 3 , HfN, Hf 3 N 4 and Hf-O (Figure 10c), the intensity ratio of which was 23:26:40:11 for Hf 4 N 3 :HfN:Hf 3 N 4 :Hf-O.…”

Section: Multilayered Hf-si-n Coatingsmentioning

confidence: 99%

Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings

2018

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Monolithic Hf-Si-N coatings and multilayered Hf-Si-N coatings with cyclical gradient concentration were fabricated using reactive direct current magnetron cosputtering. The structure of the Hf-Si-N coatings varied from a crystalline HfN phase, to a mixture of HfN and amorphous phases and to an amorphous phase with continuously increasing the Si content. The multilayered Hf 48 Si 3 N 49 coatings exhibited a mixture of face-centered cubic and near-amorphous phases with a maximal hardness of 22.5 GPa, a Young's modulus of 244 GPa and a residual stress of −1.5 GPa. The crystalline phase-dominant coatings exhibited a linear relationship between the hardness and compressive residual stress, whereas the amorphous phase-dominant coatings exhibited a low hardness level of 15-16 GPa; this hardness is close to that of Si 3 N 4 . Various oxides were formed after annealing of the Hf-Si-N coatings at 600 • C in a 1% O 2 -99% Ar atmosphere. Monoclinic HfO 2 formed after Hf 54 N 46 annealing and amorphous oxide formed for the oxidation-resistant Hf 32 Si 19 N 49 coatings. The oxidation behavior with respect to the Si content was investigated by using transmission electron microscopy and X-ray photoelectron spectroscopy.

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Section: Multilayered Hf-si-n Coatingsmentioning

confidence: 99%

Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings

2018

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“…In late decades, transition metal nitrides (TMN) films have been frequently applied as protective coatings to promote component properties and to prolong the service life in versatile aspects, such as drilling, cutting, molding, tribological resistance, and functional surfaces [1][2][3][4]. Material systems, like TiN [5], CrN [6], TaN [7], and MoN [8], and their dual or even multinary nitride layers [9][10][11][12][13], are intensively studied to meet modern demands. Amongst the frequently used nitrides, the Mo-N film draws attention because of its sufficient hardness and Young's modulus, and relatively lower friction coefficient.…”

Section: Introductionmentioning

confidence: 99%

Microstructure Evolution and Mechanical Behavior of Mo–Si–N Films

et al. 2020

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The molybdenum silicon nitride (Mo–Si–N) films were deposited by a radio frequency (RF) magnetron reactive dual-gun co-sputtering technique with process control on input power and gas ratio. Composition variation, microstructure evolution, and related mechanical and tribological behavior of the Mo–Si–N coatings were investigated. The N2/(Ar + N2) flow ratios were controlled at 10/20 and 5/20 levels with the tuning of input power on the Si target at 0, 100, and 150 W. As the silicon contents increased from 0 to 33.7 at.%, the film microstructure evolved from a crystalline structure with Mo2N and MoN phases to an amorphous feature with the Si3N4 phase. The analysis of selected area electron diffraction patterns in TEM also indicated an amorphous feature of the Mo–Si–N films when Si content reached 20 at.% and beyond. The hardness and Young’s modulus changed from 16.5 to 26.9 and 208 to 273 GPa according to their microstructure features. The highest hardness and modulus were attributed to nanocrystalline Mo2N and MoN with Si solid-solution. The crystalline Mo–Si–N films showed a smooth tribological track and less wear failure was found. In contrast, the wear track with severe failures were observed for Mo–N and amorphous Mo–Si–N coatings due to their lower hardness. The ratios of H/E and H3/E2 were intensively discussed and correlated to the wear behavior of the Mo–Si–N coatings.

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“…The nc-Me n N/a-Si 3 N 4 model could not be applied to most Si-containing metal-nitride films. In our previous studies on Ta-Si-N [12], Nb-Si-N [13] and Zr-Si-N [14] coatings, fabricated using direct-current magnetron sputtering (DCMS) (introducing high Si contents into nitrides), formed an amorphous structure on X-ray and improved the oxidation resistance; although their mechanical properties deteriorated. Therefore, high-Si-content Ta-Si-N [15] and Zr-Si-N [16] coatings are applied for glass molding dies, which are operated under a low oxygen-containing atmosphere at approximately 600 • C. By contrast, the low-Si-content Zr-Si-N coatings exhibited a crystalline structure accompanied with a hardness level of 23-24 GPa and a compressive stress of less than 2 GPa [14].…”

Section: Introductionmentioning

confidence: 99%

Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering

2018

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Zr-Si-N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investigated. The HiPIMS/RFMS co-sputtered Zr-Si-N films were under-stoichiometric. These films with Si content of less than 9 at.%, and N content of less than 43 at.% displayed a face-centered cubic structure. The films' hardness and Young's modulus exhibited an evident relationship to their compressive residual stresses. The films with 2-6 at.% Si exhibited high hardness of 33-34 GPa and high Young's moduli of 346-373 GPa, which was accompanied with compressive residual stresses from −4.4 to −5.0 GPa.

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Mechanical properties, bonding characteristics, and oxidation behaviors of Nb–Si–N coatings

Cited by 17 publications

References 42 publications

Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings

Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings

Microstructure Evolution and Mechanical Behavior of Mo–Si–N Films

Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering

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