Mechanical properties of TiN films prepared in glow-arc transition region

Liu, Hongri; Jiang, Bailing; Li, Hongtao

doi:10.1080/02670844.2020.1778412

Cited by 2 publications

(1 citation statement)

References 17 publications

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“…Various coatings have been proposed for this purpose, including TiN and TiC [5]. However, the TiN coating is less resistant to oxidation [6]. When the temperature reaches 500 ◦ C, the coating is obviously oxidized and ablated.…”

Section: Introductionmentioning

confidence: 99%

Effect of bias voltages on microstructure and mechanical properties of (AlCrNbSiTi)N high entropy alloy nitride coatings deposited by arc ion plating

Liu

Zhang

Zeng

et al. 2023

Surface Engineering

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AlCrNbSiTi)N coatings were prepared by arc ion plating at a bias voltage in the range of −50 to −200 V. The as-deposited coatings were all found to have a face-centred cubic structure and exhibit columnar crystal. Si 3 N 4 is distributed in the columnar grains in the form of a network, which separates the columnar grains into fine grains. Si 3 N 4 presents a crystalline state and grows coherently with the surrounding grains to form a nc-(AlCrNbTi)N/nc-Si 3 N 4 nanocomposite structure. The coating with the finest mechanical characteristics was applied at −200 V. The hardness, elastic modulus and wear rate are 34.76, 425 GPa and 0.82 × 10 −9 mm 3 N −1 m −1 , respectively. Based on the outstanding mechanical performance of the coating, it is concluded that the (AlCrNbSiTi)N protective coating has a broad range of potential applications.

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Section: Introductionmentioning

confidence: 99%

Effect of bias voltages on microstructure and mechanical properties of (AlCrNbSiTi)N high entropy alloy nitride coatings deposited by arc ion plating

Liu

Zhang

Zeng

et al. 2023

Surface Engineering

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Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films

Cristea,

Scărlătescu,

Bulai

et al. 2024

Journal of Vacuum Science &Amp; Technology A

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Reactive magnetron sputtering was used to deposit Ti:Zr-O-N thin films, by using a single Zr target, with Ti ribbons placed on the erosion track of the Zr sputtering target. Zr-O-N thin films have been also deposited in the same chamber to be used as reference films. The number of Ti ribbons, the applied sputtering current, and the reactive gas flow were the variable parameters. The films were analyzed in terms of structural development and mechanical properties (instrumented indentation, adhesion scratch testing, and wear analysis). The films are either amorphous or composed of a mixture of crystalline phases based on zirconium and titanium oxides or nitrides. Hardness values are situated between ∼10 and 11 GPa for the reference films (deposited without Ti) and up to ∼22 GPa for one of the Ti:Zr-O-N films. The films deposited without Ti behave slightly better in terms of adhesion to the substrate in comparison to the remaining samples in relation to the occurrence of first cracks (Lc1, critical load 1) and for first delamination (Lc2, critical load 2), a phenomenon probably related to the lower hardness of these films, which can accommodate the plastic deformation caused by the diamond indenter, prior to the occurrence of delamination. Adhesion to the substrate is a critical characteristic during wear tests since some of the coatings exhibit severe delamination.

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Mechanical properties of TiN films prepared in glow-arc transition region

Cited by 2 publications

References 17 publications

Effect of bias voltages on microstructure and mechanical properties of (AlCrNbSiTi)N high entropy alloy nitride coatings deposited by arc ion plating

Effect of bias voltages on microstructure and mechanical properties of (AlCrNbSiTi)N high entropy alloy nitride coatings deposited by arc ion plating

Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films

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