2017
DOI: 10.1088/1742-6596/872/1/012035
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Mechanical properties of titanium nitride films obtained by reactively sputtering with hot target

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Cited by 19 publications
(10 citation statements)
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“…To address this gap, TiN was modified with Nafion to protect the material from interacting with other species in the sample, which in turn affects the sensitivity of the sensor [ 36 , 37 ]. Overcoming this issue paves the path for the future development of a robust and reliable pH sensor for chemical and biological applications [ 38 , 39 ]. Experiments, analysis, and applications of the TiN sensor with Nafion modification are presented in the following sections.…”
Section: Introductionmentioning
confidence: 99%
“…To address this gap, TiN was modified with Nafion to protect the material from interacting with other species in the sample, which in turn affects the sensitivity of the sensor [ 36 , 37 ]. Overcoming this issue paves the path for the future development of a robust and reliable pH sensor for chemical and biological applications [ 38 , 39 ]. Experiments, analysis, and applications of the TiN sensor with Nafion modification are presented in the following sections.…”
Section: Introductionmentioning
confidence: 99%
“…Sputtering parameters, such as gas ratio, chamber pressure, and deposition power, were varied to optimize the sensor performance. Several trials of deposition runs have been conducted in various (nitrogen-deficient and nitrogen-rich) conditions and confirmed that the argon flow rate influenced the grain size, whilst the argon and nitrogen gas ratio determined the structural and electrical properties of the TiN films [ 29 , 30 ]. It was noted that the color of the TiN films (as shown in Figure 2 ) was related to the sputtering process parameters.…”
Section: Resultsmentioning
confidence: 99%
“…Previous work carried out in 1997 on metal nitrides showed that, for example, zirconium nitride (ZrN) and hafnium nitride (HfN), have exceptional surface-stability because of their interlinked mixture of covalent and ionic bonds [ 28 ]. Subsequently, research work on metal nitrides was conducted in 2001, where, a pH sensor integrating Complementary Metal Oxide Semiconductor (CMOS) in conjunction with an Extended Gate Field Effect Transistor (EGFET) was fabricated on the same chip using titanium nitride (TiN) as a sensing membrane, demonstrating a sensitivity of −57 mV/pH [ 27 , 29 ]. Later, in 2011, Y.H Chang et al [ 23 ] showed that Group-III nitrides, including GaN, AlN, InN, and their alloys are promising materials for next-generation chemical and biological sensors.…”
Section: Introductionmentioning
confidence: 99%
“…Out of all the TMNs, one of the most commonly used thin film materials is the TiN due to its unique properties such as less resistivity, proper adhesion, higher wear and oxidation resistance, superior corrosion resistance, better chemical stability, higher hardness, etc. [ 79–83 ]…”
Section: Surface Properties and Applications Of Tmnsmentioning
confidence: 99%
“…Out of all the TMNs, one of the most commonly used thin film materials is the TiN due to its unique properties such as less resistivity, proper adhesion, higher wear and oxidation resistance, superior corrosion resistance, better chemical stability, higher hardness, etc. [79][80][81][82][83] 3.1.1. Surface Properties of TiN Films Nishat Arshi et al [84] studied the effect of Ar (5, 10, 15, and 20 sccm) and N 2 (fixed at five sccm) flow rates on the properties of TiN films deposited on a silicon substrate, employing DC magnetron sputtering process.…”
Section: Tinmentioning
confidence: 99%