An explicit solution, considering the interface bending resistance as described by the Steigmann-Ogden interface model, is derived for the problem of a spherical nano-inhomogeneity (nanoscale void/inclusion) embedded in an infinite linear-elastic matrix under a general uniform far-field-stress (including tensile and shear stresses). The Papkovich-Neuber (P-N) general solutions, which are expressed in terms of spherical harmonics, are used to derive the analytical solution. A superposition technique is used to overcome the mathematical complexity brought on by the assumed interfacial residual stress in the Steigmann-Ogden interface model. Numerical examples show that the stress field, considering the interface bending resistance as with the Steigmann-Ogden interface model, differs significantly from that considering only the interface stretching resistance as with the Gurtin-Murdoch interface model. In addition to the size-dependency, another interesting phenomenon is observed: some stress components are invariant to interface bending stiffness parameters along a certain circle in the inclusion/matrix. Moreover, a characteristic line for the interface bending stiffness parameters is presented, near which the stress concentration becomes quite severe. Finally, the derived analytical solution with the Steigmann-Ogden interface model is provided in the supplemental MATLAB code, which can be easily executed, and used as a benchmark for semi-analytical solutions and numerical solutions in future studies.6 of 37 pages ellipsoidal, etc.). More complex loads may also be considered, such as far-field bending.The rest of this paper is organized as follows: In Section 2, the governing equations for the 3D nano-inhomogeneity with Steigmann-Ogden interface are briefly stated. In Section 3, the Papkovich-Neuber solutions and spherical harmonics are detailed. Then using the Steigmann-Ogden interface description and the far-field conditions, the explicit analytical solution to the considered nano-inhomogeneity problem is given in Section 4. In Section 5, we discuss the influences of the interface bending on stress distributions within and around the nano-inhomogeneity(nano-void/inclusion), when the far-field tensile/shear loads are applied. In Section 6, we complete this paper with some concluding remarks.