2001
DOI: 10.1070/rc2001v070n04abeh000603
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Mechanism of thermal decomposition of silanes

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Cited by 32 publications
(22 citation statements)
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“…The signal corresponding to the molecular ion (m/z 32) is rather weak. The even weaker signal at m/z 33 and m/z 34 (not visible) are isotope peaks caused by the natural abundances of 29 Si, 30 Si and 2 H. There is good agreement between our measured mass spectrum and the mass spectrum from the literature [66] (Fig. 4a, lower pane).…”
Section: Monosilanesupporting
confidence: 72%
See 1 more Smart Citation
“…The signal corresponding to the molecular ion (m/z 32) is rather weak. The even weaker signal at m/z 33 and m/z 34 (not visible) are isotope peaks caused by the natural abundances of 29 Si, 30 Si and 2 H. There is good agreement between our measured mass spectrum and the mass spectrum from the literature [66] (Fig. 4a, lower pane).…”
Section: Monosilanesupporting
confidence: 72%
“…13,16,[20][21][22][23][24][25][26][27], have been conducted to broaden the understanding of the monosilane pyrolysis. It is commonly accepted that the pyrolysis occurs through a series of chemical reactions, including SiASi bond formation and hydrogen elimination, producing silanes with increasing number of Si atoms [13,20,22,23,28,29]. Additionally, 1,2-hydrogen shifts, ring opening and ring closing lead to interconversion between different isomers within each silane family [22,23,30,31].…”
Section: Pyrolysis Of Sih 4 In Solar Silicon Industrymentioning
confidence: 99%
“…(57) Abstract: The invention concerns a gas distribution arrangement, a device for handling a chemical reaction comprising such a gas distribution arrangement and a method of providing a chemical reaction chamber with a gas. The distribution arrangement cornprises a distribution plate (16) for separating a chemical reaction chamber (14) from a gas inlet area (12) and having a first side (20) arranged to face the chemical reaction chamber and a second side(l8) arranged to face the gas inlet area and comprising a set of through holes stretching between the first and the second side, where the first side of the plate comprises a first material surrounding the holes and having a first thermal conductivity, and the plate also comprises a second material forming a base structure also surrounding the holes and having a second thermal conductivity. One known distribution pla~e is described in OS 3, 889 , 631 .…”
Section: Resultsmentioning
confidence: 99%
“…of having the gas in the inlet area 12 close to the reaction temperature is that the loss of temperature of the gas due to passing through the 10 throughholes 22 will not significantly affect the efficiency of gas chemical reaction of the gas after e xiting the throughholes 22 into the reaction chamber While the invention has been described in connection with what is presently considered to be most practical and preferred embodiments , it is to be understood that 5 the invention is not to be limited to the disclosed embodiments, but on the contrary, is intended to cover various modifications and equivalent arrangements. reactor for silicon production , comprising a distribution plate (16) for separallng a chemical reaction chamber (14) from a gas inlet area (12) and having a first side (20) arranged to face Lhe chemical reaction chamber and a second side (18) arranged to face the gas inlet area, the 10 distribution plate comprising a set of throughholes (22) 17 . The gas distribution arrangement according to any previous claim, further comprising at least one heat diverting element (17) connected to the base structure .…”
Section: Brief Description Of the Drawingsmentioning
confidence: 99%
“…However, whereas suboptimal deposition due to low temperature may lead to hydrogen inclusions for silanes, they will lead to chlorine inclusions for chlorosilane based depositions [40]. This may be improved by going to higher temperatures and higher hydrogen to TCS ratios, as these will increase reverse mechanisms leading to continual chlorine removal.…”
Section: Fbrmentioning
confidence: 99%