Mechanisms for the degradation of phosphor excitation efficiency by short wavelength vacuum ultraviolet radiation in plasma discharge devices

Takeda, Eiji; Zukawa, Takehiro; Ishibashi, Tasuku; Yoshino, K.; Morita, Yosuke; Fujii, Minoru

doi:10.1016/j.jpcs.2018.08.033

Cited by 6 publications

(1 citation statement)

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“…The phosphor degradation determined the luminace lifetime of a flat panel display. The degradation has been studied in detail by many teams and it has been shown that it is a complex process induced by many species such as UV photons, electron bombardment [267], and sputter deposited material from the cathode [268]. One of the reported species are also negative ions [269].…”

Section: Functional Film Propertiesmentioning

confidence: 99%

The measurement and impact of negative oxygen ions during reactive sputter deposition

Depla

2023

Critical Reviews in Solid State and Materials Sciences

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Many thin film applications are based on oxides. The optimization of the oxide properties is an on-going process and requires a deep understanding of the deposition process. A typical feature of reactive (magnetron) sputter deposition is the presence of negative oxygen ions. Two groups of ions can be identified based on their energy. Low energy ions are generated in the bulk of the discharge. The high energy ions are emitted from the oxide or oxidized target surface. As these ions are generated at the cathode, they are accelerated by the electric field towards the growing film. Depending on the discharge voltage and the powering method, their energy is typically several tenths to hundreds electron volt. As such the ions can have a strong impact on the film properties. In the case of magnetron sputtering, this will lead to inhomogenous film properties over the substrate facing the locally eroded target. Due to their high energy, the trajectory of negative ions can be easily predicted which has led to several strategies to avoid negative ion bombardment such as facing target sputtering and off-axis sputtering. This paper reviews several facets of the production, the measurements and the impact on the film properties of negative ions during reactive sputtering. Despite the many illustrative studies on the impact of negative oxygen ions, quantification is often lacking as the negative ion yield is only known for a few oxides. The compilation of several literature sources allows the discussed trends to be placed in a quantitative framework.

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Section: Functional Film Propertiesmentioning

confidence: 99%