1990
DOI: 10.1016/0040-6090(90)90468-s
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Mechanisms of oriented crystallization in artificial epitaxy (graphoepitaxy)

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Cited by 23 publications
(15 citation statements)
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“…In graphoepitaxy, by contrast, the surface relief structure of the substrate directs epitaxial growth of an overlying crystalline film [185]. This relief structure can have a length scale much larger than the lattice parameter of the film and the substrate need not be a single crystal or even crystalline [186][187][188]. Both techniques have been adapted to pattern the organization of block copolymers.…”
Section: Epitaxymentioning
confidence: 99%
“…In graphoepitaxy, by contrast, the surface relief structure of the substrate directs epitaxial growth of an overlying crystalline film [185]. This relief structure can have a length scale much larger than the lattice parameter of the film and the substrate need not be a single crystal or even crystalline [186][187][188]. Both techniques have been adapted to pattern the organization of block copolymers.…”
Section: Epitaxymentioning
confidence: 99%
“…This technique has previously been successfully employed to investigate thin films on highly oriented PTFE, although with a different experimental set-up. [14±16] Evidence has been gathered for meso-epitaxial growth; i.e., the alignment/orientation behavior of HBC-C8,2 seems to be dictated by a combination of molecular epitaxy (commensurate growth guided by lattice matching criteria) [8,9,17] and surface-topology-induced epitaxy (ªgraphoepitaxyº, where surface patterns generate orientation), [18][19][20] as will be briefly discussed below. (A full description and detailed analysis of these X-ray results will be published elsewhere).…”
mentioning
confidence: 99%
“…From the peak positions, the 2D unit cell was determined in which the HBC-C8,2 columns are arranged (cut perpendicular to the surface and the columns). Three orientations of a quasi-hexagonal structure, denoted HBC-C8,2 0 , HBC-C8,2 19.1 , and HBC-C8,2 35.2 (respectively in Figs. 3d, e, f) have been found to coexist. The differences between these phases lie in the arrangement with respect to the polymer alignment layer, which is probably related to dissimilar growth mechanisms.…”
mentioning
confidence: 99%
“…Silica microspheres of 280 ± 5 nm diameter produced by the Stöber method [17] were organized into planar silica colloidal crystals by the evaporative deposition method. [18] The surface of the spheres and substrate was then modified with chlorosilane 1, [19] where displacement of the chlorine by silica silanol groups produces a surface layer of polymerizable groups. This step is essential to obtain a material with good adhesion to the substrate.…”
Section: A Polychromic Fast Response Metallopolymer Gel Photonic Crymentioning
confidence: 99%