1993
DOI: 10.1016/0921-5093(93)90349-j
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Mechanisms of r.f. plasma nitriding of Ti-6Al-4V alloy

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Cited by 32 publications
(21 citation statements)
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“…The error bar are now reduced mainly in its depths spreads, showing most expected values at near surface region in agreement with literature data 4,[7][8][9][10]12 . In order to verify if the corrected values, obtained by the present analysis process, were not influenced by artifacts that can be introduced by this correction, it was also performed another correction recently introduced and based in the adjustment of the loading curve by using a power law function fitting (Odo-Lepienski method 5 ).…”
Section: Resultssupporting
confidence: 77%
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“…The error bar are now reduced mainly in its depths spreads, showing most expected values at near surface region in agreement with literature data 4,[7][8][9][10]12 . In order to verify if the corrected values, obtained by the present analysis process, were not influenced by artifacts that can be introduced by this correction, it was also performed another correction recently introduced and based in the adjustment of the loading curve by using a power law function fitting (Odo-Lepienski method 5 ).…”
Section: Resultssupporting
confidence: 77%
“…All of these phases have hardness higher than titanium substrate 4,[7][8][9][10]12 . Consequently, it is expected that the hardness profiles decrease with depth until reaching the substrate value.…”
Section: Resultsmentioning
confidence: 99%
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“…The intergranular β phase is, thereby, absent at the top region of the Ti-N compound layer. Raveh [11] reported that for a plasma nitrided Ti-6Al-4V alloy, aluminum and vanadium concentrations decreased in the nitrided layer and aluminum depletion near the surface promoted the initiation of TiN formation. In this study, vanadium, which stabilizes cubic β-Ti, was depleted in the Ti-N compound layer, and in the equiaxed α-Ti grains in the Ti(N) diffusion layer.…”
mentioning
confidence: 98%
“…The samples nitrided for 18 h exhibited a relatively thicker nitrided layer compared to the samples nitrided for 4 h. As the nitriding was performed at the relatively low temperature of 520°C, the compound layer and diffusion layer could not be distinguished. Raveh [20] reported that the thickness of the compound and diffusion layer was 2-8 and 2-20 lm, respectively, for Ti-6Al-4V plasma nitrided at 490°C for different lengths of time (10 min to 10 h). Table 1 shows the surface roughness values of samples in different conditions.…”
Section: Methodsmentioning
confidence: 99%