Medical Applications of Excimer Lasers

Lubatschowski, Holger

doi:10.1007/3-540-26667-4_28

Cited by 2 publications

(2 citation statements)

References 29 publications

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“…The key of this route is to use commercial UV-Excimer laser systems as tools, taking advantage that reliability of these equipments has been dramatically improved in the last decade in terms of beam quality, power stability and gas lifetime. Nowadays, efficient high power Excimer laser systems are extensively employed in different application fields, being eye surgery to correct errors of refraction by laser ablation or removing extremely thin layers of corneal tissue without damaging adjacent areas, one of the most popular reliable applications (18).…”

Section: Introductionmentioning

confidence: 99%

(Invited) UV Excimer Laser Assisted Heteroepitaxy of (Si)GeSn on Si(100)

et al. 2014

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Fabrication of Photonic Integrated Circuits (PICs) using CMOS compatible direct bandgap Group-IV heterostructures is of increasing concern from scientific, technological, and economic point of view. Growth of group IV alloys, such as the Silicon-Germanium-Tin (Si-Ge-Sn) binaries and ternaries through CMOS compatible techniques is therefore of particular interest. This contribution presents UV-Laser based processes, such as Laser induced Chemical Vapor Deposition (LCVD) and Pulsed Laser Induced Epitaxy (PLIE) combined with conventional processing techniques, for material synthesis as well as results obtained growing different (Si)GeSn binary and ternary systems for material and lattice engineering. Synthesis of epitaxial (Si)GeSn alloys with above 10% Sn in large areas and of SiGeSn/GeSn micropatterns, through scanning and mask projection assisted PLIE, respectively, will be discussed. Emphasis will be placed on the influence of processing parameters on compositional and structural properties of the epitaxial alloys.

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Section: Introductionmentioning

confidence: 99%

(Invited) UV Excimer Laser Assisted Heteroepitaxy of (Si)GeSn on Si(100)

et al. 2014

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“…They are also extensively employed for marking textiles and polymers, modifying structure and chemical properties of surfaces, as well as used in communication and sensor technologies, among many other application fields (1). The medical sector has successfully implemented laser systems as tools, being eye surgery to correct errors of refraction by laser ablation or removing extremely thin layers of corneal tissue without damaging adjacent areas, as well as dental and aesthetic treatments the most popular applications (2).…”

Section: Introductionmentioning

confidence: 99%

(Invited) Pulsed UV-Laser Processing of Amorphous and Crystalline Group IV Semiconductors

Chiussi¹,

Gontad²,

Stefanov³

et al. 2011

ECS Trans.

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In the last decade, UV-Excimer laser systems have been dramatically improved in terms of beam quality, power stability and gas lifetime. The benefits of using them for group IV semiconductor processing have, up to now, principally been recognized for some few processes like laser marking, UV-lithography and Excimer Laser Crystallization (ELC). Although several other techniques like Laser induced Chemical Vapor Deposition (LCVD), Excimer Laser Annealing (ELA) and Pulsed Laser Induced Epitaxy (PLIE) have been extensively studied 30 years ago for producing silicon coatings, little is known about the prospects of up-scaling those processes to other group IV semiconductors. This contribution presents UV-Laser processes combining LCVD of amorphous Si and of SiGeC alloys with their subsequent laser, in particular PLIE, treatment for modifying their composition and structure in order to engineer lattice parameters.

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Medical Applications of Excimer Lasers

Cited by 2 publications

References 29 publications

(Invited) UV Excimer Laser Assisted Heteroepitaxy of (Si)GeSn on Si(100)

(Invited) UV Excimer Laser Assisted Heteroepitaxy of (Si)GeSn on Si(100)

(Invited) Pulsed UV-Laser Processing of Amorphous and Crystalline Group IV Semiconductors

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