The frequency-dependent ferroelectric properties of 45 nm (Al,Sc)N films sputter deposited on complementary metal-oxide-semiconductor (CMOS)-compatible Al metal electrodes are measured and compared. Low in-plane compressive stress (À10 AE 20 MPa) is observed in (Al,Sc)N thin films deposited on Al electrodes. The (Al,Sc)N films exhibit an imprint in the measured coercive fields (E c ) of À4.3/þ5.3 MV cm À1 at 10 kHz. Utilizing positive-up negative-down (PUND) measurements, ferroelectric switching is observed within %200 ns of an applied voltage pulse, which demonstrates the ability of ferroelectric (Al,Sc)N to achieve the fast read/write speeds desired in memory devices.