MEMS-based fabrication of high-performance inductors with back hollow structure and ferromagnetic film

Wang, Gang; Liu, Houfang; Qiu, Haochuan; Ning, Keyu; Yang, Yi; Li, Xiaoli; Xu, Xianglan; Lavanant-Jambert, Marion; Petit-Watelot, Sébastien; Lü, Yuan

doi:10.1016/j.mee.2016.10.005

Cited by 5 publications

(1 citation statement)

References 23 publications

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“…Due to demand for high performance and small size, RF tunable inductors have a major role in RF circuit design. Although the MEMS structures were widely used in many applications, they require complex fabrication and structures [2,3]. To achieve high quality and low loss requirements, the size of the inductor is usually large, and the fabrication process is normally complicated compared to the device proposed in this article [4][5][6].…”

Section: Introductionmentioning

confidence: 99%

Tunable Inductors Using Integrated Vanadium Dioxide Phase Change Thin Films

Wang

Shin

et al. 2018

Advances in Condensed Matter Physics

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This paper presents tunable inductors designed with vanadium dioxide (VO 2 ) thin film to implement tunability. Two types of configurations, a single line coil inductor and a dual line coil inductor, are proposed. Tunable inductance is realized by thermally controlling VO 2 thin film stub to be an insulator or a conductor. The measurements of inductors are taken in the frequencies range from 0.01 GHz to 10 GHz. The electrical model has been developed to derive the corresponding inductance. The results show that the tuning range is about 69% when the temperature changes from room temperature to above the critical temperature of 68 ∘ C.

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