2013
DOI: 10.1021/cm400032h
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Mesoscale Scanning Electron and Tunneling Microscopy Study of the Surface Morphology of Thermally Annealed Copper Foils for Graphene Growth

Abstract: The evolution of the surface morphology of thermally annealed copper foils utilized for graphene growth by Chemical Vapor Deposition (CVD) has been studied by Scanning Tunneling Microscopy, Scanning Electron Microscopy, and optical microscopy to determine the effect of pretreatment and preannealing steps that aimed to increase grain size and reduce surface roughness for subsequent graphene growth. The results of the study show that (a) Fe(NO 3 ) 3 etch pretreatment leaves residue and etch quarries on the Cu su… Show more

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Cited by 25 publications
(20 citation statements)
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“…The etching (e.g. using Fe(NO 3 ) 3 ) also does not lead to satisfactory results, since etch quarries and residues are left on the surface, even after subsequent foil annealing [33].…”
Section: Resultsmentioning
confidence: 99%
“…The etching (e.g. using Fe(NO 3 ) 3 ) also does not lead to satisfactory results, since etch quarries and residues are left on the surface, even after subsequent foil annealing [33].…”
Section: Resultsmentioning
confidence: 99%
“…Thus, the quality of graphene film strongly relies on the surface morphology of underlying Cu substrate [14].…”
mentioning
confidence: 99%
“…Cu). [26][27][28][29][30] In addition, increasing the growth time on Cu foils under LPCVD can effectively decrease the density of bilayer graphene region mixing with monolayer graphene film. 5a and b).…”
Section: Lpcvd For Uniform Graphene Filmsmentioning
confidence: 99%