Mesostructured thin films deposited by PECVD from TMGe

Amorphous non-hydrogenated germanium carbide (a-Ge 1Àx C x ) films have been deposited using magnetron co-sputtering technique by varying the sputtering power of germanium target (P Ge ). The effects of P Ge on composition and structure of the a-Ge 1Àx C x films have been analyzed. The FTIR spectrum shows that the C-Ge bonds were formed in the a-Ge 1Àx C x films according to the absorption peak at~610 cm À1 . The Raman results indicate that the amorphous films also contain both Ge and C clusters. The XPS results reveal that the carbon concentration decreased as P Ge increased from 40 to 160 W. The fraction of sp 3 C-C bonds remains almost constant when increasing P Ge from 40 to 160 W. The sp 2 C-C content of a-Ge 1Àx C x film decreases gradually to 35.9% with P Ge up to 160 W. Nevertheless, sp 3 C-Ge sites rose with increasing P Ge . Furthermore, the hardness and the refractive index gradually increased with increasing P Ge . The excellent optical transmission of annealed a-Ge 1-x C x double-layer coating at 400 C suggests that a-Ge 1Àx C x films can be used as an effective anti-reflection coating for the ZnS IR window in the wavelength region of 8-12 mm, and can endure higher temperature than hydrogenated amorphous germanium carbide do.

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“…(c). The fitting result is evident indicative of the fact that amorphous germanium clusters exist in the films …”

Section: Resultsmentioning

confidence: 93%

Non‐hydrogenated amorphous germanium carbide with adjustable microstructure and properties: a potential anti‐reflection and protective coating for infrared windows

Han

Jiang

Zhu

2012

Surface & Interface Analysis

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“…For example, the refractive index and optical gap can be varied in a wide range with the ratio of C and Ge, which makes it a good candidate as the antireflection and protection coating of infrared windows [1,2]. The films can be prepared using the different deposition methods, such as activated reactive evaporation (ARE) [3], plasma-enhanced chemical vapor deposition [4,5], reactive magnetron sputtering [6,7] and glow discharge [8]. However, a great deal of hydrogen content from the precursors has been remained in the films.…”

Section: Introductionmentioning

confidence: 99%

Chemical bonding and optical properties of germanium–carbon alloy films prepared by magnetron co-sputtering as a function of substrate temperature

Jiang

Zhu

Han

et al. 2011

Journal of Non-Crystalline Solids

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“…The cubic phase exists in the range from 2370°C to the melting point of 2680°C (5,6). Zirconia films can be obtained by different methods, among most widespread, sputtering (7), atomic layer deposition (ALD) (8), sol-gel processing (9), chemical vapour deposition (CVD) (10), chemical solution deposition (11), electron beam deposition and electrochemical deposition (12). In this work, ZrO 2 was deposited by metallo-organic chemical vapor deposition (MOCVD), which is a kind of CVD techniques using organometallic precursors (13).…”

Section: Introductionmentioning

confidence: 99%

Texture and Residual Stress Analysis by XRD on Metastable Tetragonal Zirconia Films Obtained by MOCVD

Jouili¹,

Andrieux²,

Gallet³

et al. 2009

ECS Trans.

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Zirconia films were deposited by MOCVD using Zr 2 (OiPr) 6 (thd) 2 on silicon substrate under different pressures. Grazing incidence X-ray diffraction (GIXRD) patterns showed the predominance of the tetragonal phase (or cubic). The intensity ratio of (111) t-c and (200) t-c diffraction peaks increased with the reactor pressure. The field emission gun scanning electron microscope (FEG-SEM) observation revealed that the film thickness increased and the grain size decreased with increasing the reactor pressure. The films morphology, as well as the amount of the stress in ZrO 2 films depend on their thickness: compressive stress for the thinner layers and tensile stress for the thick ones. A high peak intensity was observed at the center of the {200} pole figures showing that the majority of the surfaces plane were parallel to (100) plane. A well developed crystallographic {200} texture correspond to the alignment of the columns occurred in the films.

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Mesostructured thin films deposited by PECVD from TMGe

Cited by 11 publications

References 17 publications

Non‐hydrogenated amorphous germanium carbide with adjustable microstructure and properties: a potential anti‐reflection and protective coating for infrared windows

Non‐hydrogenated amorphous germanium carbide with adjustable microstructure and properties: a potential anti‐reflection and protective coating for infrared windows

Chemical bonding and optical properties of germanium–carbon alloy films prepared by magnetron co-sputtering as a function of substrate temperature

Texture and Residual Stress Analysis by XRD on Metastable Tetragonal Zirconia Films Obtained by MOCVD

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