Messung der Sättigungsmagnetisierung einer dünnen mit Wasserstoff beladenen Nickelschicht

Using torque magnetometry (TM), SQUID and TEM we have investigated a series of thin (50 to 80 nm) amorphous Tb0.28Fe0.72 films. A different influence on the magnetic anisotropy by field annealing at 323 to 873 K with magnetic field either perpendicular or parallel to the sample surface is found. The pair‐ordering mechanism is believed to be the source of perpendicular anisotropy in amorphous Fe–Tb films which corresponds to results from measurements of pair distribution functions (pdfs) by in‐situ‐TEM experiments. Unidirectional anisotropy was found in the sample plane which corresponds to the orientation of the external magnetic field during the annealing process. The magnetic (TM) and structural (TEM) results obtained suggest that the unidirectional anisotropy is due to the tilt of the easy axis from the film normal as a consequence of dual magnetron sputtering.

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Magnetocrystalline anisotropy of electrolytically deposited single-crystal Ni-Fe films

Michalke¹,

Spinarke²

1970

Phys. Stat. Sol. (a)

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Messung der Sättigungsmagnetisierung einer dünnen mit Wasserstoff beladenen Nickelschicht

Cited by 24 publications

References 3 publications

45 Years of nickel hydride—History and perspectives

45 Years of nickel hydride—History and perspectives

Influence of Field-Annealing on the Magnetic Anisotropy of Amorphous Fe–Tb Films

Magnetocrystalline anisotropy of electrolytically deposited single-crystal Ni-Fe films

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