Metal 1D micro(nano) self-organized wires on semiconductor surface: Preparation, topology, and optical properties

Preparation and Characterization and Reducing Properties of MoO3 Nano-Fibers

“…Development of one-dimensional (1D) materials has become a focal area in nanostructured materials research, owing to their special characteristics which differ from those of respective bulk crystals (Romo-Herrera, 2007). These highly anisotropic 1D materials include elemental carbon, metals, semiconductor, alloys, sulfides, oxides, hydroxides, and so forth (Dmitruk, 2007). Among the important layered transition metal oxides and chalcogenides have been extensively investigated (Shabaev 2004).…”

IR reflection, attenuated total reflection, and Raman scattering of porous polar III–V semiconductors

“…Namely, more than 100‐fold increase of second harmonic generation, a reduction of the refractive index (which should change their dielectric properties), and appearance of optical anisotropy have been observed. In addition, such type of materials have been used for preparation of so‐called photonic crystals, waveguides (by changing of the current density and the duration of anodization process), antireflectance coatings for solar cells, and as some buffer layers for epitaxial growth of non‐matching heteropairs 14–16, and also as templates for metal nanoparticles deposition 17 etc . Thus, strongly changed phonon spectrum and plasmon–phonon modes in porous doped polar semiconductors determine their important optical applications.…”

Dewetting of copper nanolayers on silica in oxygen: towards preparation of copper meso/nanowires by self-organization

“…For example, crystalline silicon [18][19][20][21] and freshly cleaved layered-crystal surfaces [22][23][24][25] that contain line features such as step edges may be used as templates to grow meso/nanowires. In addition to the presence in nature of line features on the crystalline surface, line features may be nanostructured into or created on the solid surface by electron-beam lithography [26][27][28], focused ion-beam lithography [29][30][31], surface charge lithography [32,33], optical lithography [34][35][36], laser interference lithography [37][38][39], nanoimprint lithography [40,41], microcontact printing [42][43][44], nanosphere lithography [45], scanning probe lithography [46,47], dip-pen nanolithography [48,49], oblique-angle deposition [50] and chemical anisotropic etching [51][52][53]. Some line features are patterned into substrate surfaces by a combination of different lithographic and/or etching methods [54].…”

“…Some line features are patterned into substrate surfaces by a combination of different lithographic and/or etching methods [54]. The resulting surfaces with nanostructured line features can subsequently be used as site templates for growing planar meso/nanowires via chemical solution deposition [51,55,56], wet chemical etching [28,38,57], electron-beam-induced deposition [58,59], photostimulated chemical deposition [51,53], photoelectrochemical etching [32,33,60], evaporation-induced self-assembly [55,56,61], microplasma chemical vapor deposition [62], metal-organic vapor phase epitaxy [63,64], electrochemical step edge decoration [24,26,65,66] or electrochemical deposition [36,67].…”