Metal assisted focused-ion beam nanopatterning

Kannegulla, Akash; Cheng, Li-Jing

doi:10.1088/0957-4484/27/36/36lt01

Cited by 30 publications

(15 citation statements)

References 10 publications

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“…An alternative approach to FIB milling is metalassisted FIB (MA-FIB) milling, which uses a metallic protective layer on top of the target layer [25]. The main purpose of using a protective layer in MA-FIB milling is to prevent blunt edges and protect the device surface against redeposition of milled material onto the surface.…”

Section: Discussionmentioning

confidence: 99%

Helium focused ion beam direct milling of plasmonic heptamer-arranged nanohole arrays

2019

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We fabricate plasmonic heptamer-arranged nanohole (HNH) arrays by helium (He) focused ion beam (HeFIB) milling, which is a resist-free, maskless, direct-write method. The small He+ beam spot size and high milling resolution achieved by the gas field-ionization source used in our HeFIB allows the milling of high aspect ratio (4:1) nanoscale features in metal, such as HNHs incorporating 15 nm walls of high verticality between holes in a 55-nm-thick gold film. Drifts encountered during the HeFIB milling of large arrays, due to sample stage vibrations or He beam instability, were compensated by a drift correction technique based on in situ He ion imaging of alignment features. Our drift correction technique yielded 20 nm maximum dislocation of HNHs, with 6.9 and 4.6 nm average dislocations along the horizontal and vertical directions, respectively. The measured optical resonance spectra of the fabricated plasmonic HNH arrays are presented to support the fabrication technique. Defects associated with HeFIB milling are also discussed.

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Section: Discussionmentioning

confidence: 99%

Helium focused ion beam direct milling of plasmonic heptamer-arranged nanohole arrays

2019

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“…Filling of a UV resin into nanostructures in the Si master mainly depends on the material properties of the UV resin used and the interfacial properties between the resin and the nanostructures [12, 13]. The material properties of the resin include the size (or molecular weight) of the monomer chain and the viscosity of the resin solution [4].…”

Section: Resultsmentioning

confidence: 99%

“…In this work, four UV resins with different properties were used to systematically study their filling into nanostructures in the fabrication of the UV-resin molds and their performance as thermal-NIL molds. Usually, nanostructures fabricated by direct focused ion beam (FIB) milling or metal-assist FIB milling have V-shaped and sharp cross-sections due to the re-deposition nature of FIB milling [12, 15]. Therefore, we used FIB milled sharp nanostructures as model nanostructures for this study.…”

Section: Introductionmentioning

confidence: 99%

Selection of UV-resins for nanostructured molds for thermal-NIL

2018

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Nanoimprint molds made of soft polymeric materials have advantages of low demolding force and low fabrication cost over Si or metal-based hard molds. However, such advantages are often sacrificed by their reduced replication fidelity associated with the low mechanical strength. In this paper, we studied replication fidelity of different UV-resin molds copied from a Si master mold via UV nanoimprint lithography (NIL) and their thermal imprinting performance into a thermoplastic polymer. Four different UV-resins were studied: two were high surface energy UV-resins based on tripropyleneglycol diacrylate (TPGDA resin) and polypropyleneglycol diacrylate (PPGDA resin), and the other two were commercially available, low surface energy poly-urethane acrylate (PUA resin) and fluorine-containing (MD 700) UV-resins. The replication fidelity among the four UV-resins during UV nanoimprint lithograph from a Si master with sharp nanostructures was in the increasing order of (poorest) PUA resin < MD 700 < PPGDA resin < TPGDA resin (best). The results show that the high surface energy and small monomer size are keys to achieving good UV-resin filling into sharp nanostructures over the viscosity of the resin solution. When the four UV-resin molds were used for thermal-NIL into a thermoplastic polymer, the replication fidelity was in the increasing order of (poorest) MD 700 < TPGDA resin < PUA resin (best), which follows the same order of their Young's moduli. Our results indicate that the selection of an appropriate UV-resin for NIL molds requires consideration of the replication fidelities in the mold fabrication and the subsequent thermal-NIL into thermoplastic polymers.

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“…Thanks to the fast progress in nanophotonic, the fabrication of the proposed structure is achievable with current technologies [ 73 , 74 , 75 , 76 , 77 , 78 , 79 , 80 , 81 , 82 , 83 , 84 , 85 , 86 , 87 , 88 ], allowing the cost-effective fabrication over a large area. A similar structure of a MIM waveguide with a central-coupled rectangular cavity has previously been fabricated using physical vapor deposition and a focused ion beam for etching the rectangular cavity [ 79 ].…”

Section: Structure Design and Simulation Methodsmentioning

confidence: 99%

Ultrawide Bandgap and High Sensitivity of a Plasmonic Metal-Insulator-Metal Waveguide Filter with Cavity and Baffles

et al. 2020

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A plasmonic metal-insulator-metal waveguide filter consisting of one rectangular cavity and three silver baffles is numerically investigated using the finite element method and theoretically described by the cavity resonance mode theory. The proposed structure shows a simple shape with a small number of structural parameters that can function as a plasmonic sensor with a filter property, high sensitivity and figure of merit, and wide bandgap. Simulation results demonstrate that a cavity with three silver baffles could significantly affect the resonance condition and remarkably enhance the sensor performance compared to its counterpart without baffles. The calculated sensitivity (S) and figure of merit (FOM) in the first mode can reach 3300.00 nm/RIU and 170.00 RIU−1. Besides, S and FOM values can simultaneously get above 2000.00 nm/RIU and 110.00 RIU−1 in the first and second modes by varying a broad range of the structural parameters, which are not attainable in the reported literature. The proposed structure can realize multiple modes operating in a wide wavelength range, which may have potential applications in the on-chip plasmonic sensor, filter, and other optical integrated circuits.

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Metal assisted focused-ion beam nanopatterning

Cited by 30 publications

References 10 publications

Helium focused ion beam direct milling of plasmonic heptamer-arranged nanohole arrays

Helium focused ion beam direct milling of plasmonic heptamer-arranged nanohole arrays

Selection of UV-resins for nanostructured molds for thermal-NIL

Ultrawide Bandgap and High Sensitivity of a Plasmonic Metal-Insulator-Metal Waveguide Filter with Cavity and Baffles

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