Metal-catalyzed chemical etching using DIO3 as a hole injection agent for efficient submicron-textured multicrystalline silicon solar cells

Zou, Shuai; Xu, Lei; Wu, Chengbin; Ding, Jinchang; Zhu, Lei; Sun, Huarui; Ye, Xiaoya; Wang, Xusheng; Zhang, Xiaohong; Su, Xiaodong

doi:10.1016/j.solmat.2021.111104

Cited by 8 publications

(4 citation statements)

References 35 publications

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“…A porous Si layer was then induced onto the wafer surface by etching in AgNO 3 /HF/H 2 O 2 /DIW solution, which is a well‐established one‐step MCCE process. [ 21 ] The porous Si layer acts as an artificial defect layer, [ 19 ] which can alter the etching behavior in KOH/additive/DIW texturing solution. In this way, the texturing time can be greatly shortened to achieve UFT.…”

Section: Resultsmentioning

confidence: 99%

Ultrafast Random‐Pyramid Texturing for Efficient Monocrystalline Silicon Solar Cells

Zhu

Zou

et al. 2022

Solar RRL

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Herein, an ultrafast random‐pyramid texturing process is proposed for monocrystalline silicon (mono‐Si) solar cells by combining metal‐catalyzed chemical etching (MCCE) and the standard alkaline texturing process. Namely, large numbers of artificial defects are introduced on the wafer surface in 3 min by MCCE; therefore, the process duration of alkaline texturing is largely shortened from 420 s for the as‐cut wafer to 180 s for the wafer with artificial defects due to its high surface reactivity. Moreover, those tiny artificial defects are apt to form small pyramids, resulting in a better light‐trapping performance. As a demonstration, the passivated emitter rear contact solar cell with ultrafast random pyramid texture achieves a power conversion efficiency of 23.02%. Therefore, such a cost‐effective ultrafast texturing strategy can open a promising new route toward the mass production of high‐efficiency industrial mono‐Si solar cells.

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Section: Resultsmentioning

confidence: 99%

Ultrafast Random‐Pyramid Texturing for Efficient Monocrystalline Silicon Solar Cells

Zhu

Zou

et al. 2022

Solar RRL

Self Cite

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“…A mixture of ozone and acidic solvent (for example, HF and/or HCl) is effective at removing organic and metallic contaminations [44,45]. Figure 2 shows an ozone-based cleaning system, in which ozone is generated by a generator and mixed with acidic solvent in the static mixer [46]. The mixed O 3 /HF/HCl solution is then fed into the process bath through a recirculation pump.…”

Section: Ozone-based Cleaningmentioning

confidence: 99%

Surface Cleaning and Passivation Technologies for the Fabrication of High-Efficiency Silicon Heterojunction Solar Cells

Shi

Guan

et al. 2023

Materials

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Silicon heterojunction (SHJ) solar cells are increasingly attracting attention due to their low-temperature processing, lean steps, significant temperature coefficient, and their high bifacial capability. The high efficiency and thin wafer nature of SHJ solar cells make them ideal for use as high-efficiency solar cells. However, the complicated nature of the passivation layer and prior cleaning render a well-passivated surface difficult to achieve. In this study, developments and the classification of surface defect removal and passivation technologies are explored. Further, surface cleaning and passivation technologies of high-efficiency SHJ solar cells within the last five years are reviewed and summarized.

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“…In state-of-the-art silicon solar cells, the reflectance losses have been mitigated by utilizing surface nanostructures [i.e., black silicon (b-Si)], which enable a drastic decrease in total reflectance (R) over a wide wavelength range (200-1000 nm) [7], [8], [9]. While there are different methods for the fabrication of surface nanostructures, in photovoltaics, the metal-assisted chemical etching (MACE; also known as MacEtch or MCCE) technique has turned out to be the most attractive, as it is a simple, cost-efficient, and crystal-damagefree process that has been shown to be easy to scale-up industrially [10], [11], [12], [13], [14], [15]. MACE should, therefore, offer an attractive means to reduce the reflectance losses also in industrial photodiodes.…”

Section: Introductionmentioning

confidence: 99%

Excellent Responsivity and Low Dark Current Obtained With Metal-Assisted Chemical Etched Si Photodiode

et al. 2023

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Metal-assisted chemical etched (MACE; also known as MacEtch or MCCE) nanostructures are utilized widely in the solar cell industry due to their excellent optical properties combined with a simple and cost-efficient fabrication process. The photodetection community, on the other hand, has not shown much interest toward MACE due to its drawbacks, including insufficient surface passivation, increased junction recombination, and possible metal contamination, which are especially detrimental to p-n photodiodes. Here, we aim to change this by demonstrating how to fabricate high-performance MACE p-n photodiodes with above 90% external quantum efficiency (EQE) without external bias voltage at 200-1000 nm and dark current less than 3 nA/cm 2 at −5 V using industrially applicable methods. The key is to utilize an induced junction created by an atomic layer deposited (ALD) highly charged Al 2 O 3 thin film that simultaneously provides efficient field-effect passivation and full conformality over the MACE nanostructures. Achieving close to ideal performance demonstrates the vast potential of MACE nanostructures in the fabrication of high-performance low-cost p-n photodiodes.

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Metal-catalyzed chemical etching using DIO3 as a hole injection agent for efficient submicron-textured multicrystalline silicon solar cells

Cited by 8 publications

References 35 publications

Ultrafast Random‐Pyramid Texturing for Efficient Monocrystalline Silicon Solar Cells

Ultrafast Random‐Pyramid Texturing for Efficient Monocrystalline Silicon Solar Cells

Surface Cleaning and Passivation Technologies for the Fabrication of High-Efficiency Silicon Heterojunction Solar Cells

Excellent Responsivity and Low Dark Current Obtained With Metal-Assisted Chemical Etched Si Photodiode

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