Metal direct nanoimprinting for photonics

Buzzi, Stefano; Robin, F.; Callegari, Victor; Löffler, Jörg F.

doi:10.1016/j.mee.2007.08.001

Cited by 55 publications

(41 citation statements)

References 18 publications

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“…Therefore, to eliminate fatal fracture of the sample in pressing, the form of the sample was well aligned to the mold to avoid stress concentration at the mold edges. In 2008, Buzzi devices [14]. In their procedure, they used a lateral confinement (a ring made by molybdenum alloy) to avoid the stress concentration at the edges and the excess metal flows on the sides.…”

Section: Direct Nilmentioning

confidence: 99%

Nanoimprint technology for patterning functional materials and its applications

Chen

2015

Microelectronic Engineering

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Section: Direct Nilmentioning

confidence: 99%

Nanoimprint technology for patterning functional materials and its applications

Chen

2015

Microelectronic Engineering

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“…By a reversal imprint process with SU-8, dielectric Fresnel zone plates as nanolens were fabricated on optical fibers for light focusing and imagining in bio/medical research and diagnosis [156]. More publications in this area can be found in references [157][158][159].…”

Section: Nano Metamaterials and Photonicsmentioning

confidence: 99%

Applications of nanoimprint lithography/hot embossing: a review

Chen

2015

Appl. Phys. A

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This review concentrates on the applications of nanoimprint lithography (NIL) and hot embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and other nanostructures. Technical challenges and solutions in NIL such as nanofabrication of templates, removal of residual resist, pattern displacement in thermal NIL arising from thermal expansion are first discussed. In the nanofabrication of templates, dry etch in plasma for the formation of multi-step structures and ultra-sharp tip arrays in silicon, nanophotonic chiral structures with high aspect ratio in SiC are demonstrated. A bilayer technique for nondestructive removal of residual resist in thermal NIL is described. This process is successfully applied for the fabrication of T-shape gates and functional high electron mobility transistors. However, pattern displacement intrinsically existing in thermal NIL/hot embossing owing to different thermal expansions in the template and substrate, respectively, limits its further development and scale-up. Low temperature even room temperature NIL (RTNIL) was then proposed on HSQ, trying to eliminate the pattern distortion by avoiding a thermal loop in the imprint. But, considerable pressure needed in RTNIL turned the major attentions to the development of UVcuring NIL in UV-curable monomers at low temperature. A big variety of applications by low-temperature UV-curing NIL in SU-8 are described, including high-aspect-ratio phase gratings, tagging technology by nanobarcode for DNA sequencing, nanofluidic channels, nanophotonic metamaterials and biosensors. Hot embossing, as a parallel technique to NIL, was also developed, and its applications on ferroelectric polymers as well as metals are reviewed. Therefore, it is necessary to emphasize that this review is mainly attempted to review the applications of NIL/embossing instead of NIL technique advances.

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“…They are hardened during the UV exposure by photo-initiated polymerization [35]. In addition to conventional resists, NIL can also be used for direct imprinting of active and functional materials such as biological materials [36], sol-gel precursors of semiconductor oxides [37], quantum dots [38], metals [39][40][41], conjugated polymers [42][43][44], and block copolymers [45].…”

Section: Basic Nil Processesmentioning

confidence: 99%

Nanoimprint Lithography: Toward Functional Photonic Crystals

Lova

Soci

2015

Organic and Hybrid Photonic Crystals

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In this chapter we review the use of nanoimprint lithography and its derivative soft-lithography techniques for the fabrication of functional photonic crystals. Nanoimprint is a viable, scalable, and cost-effective solution for large area patterning. While initially it relied primarily on pattern transfer from a rigid mold to a thermally softened polymer by embossing, in the last two decades the process evolved rapidly, giving rise to new technologies that allow direct imprint of functional materials such as conjugated polymers, metals, biological matter, and metal oxides. These advancements generated increasing interest in the use of nanoimprint lithography for the fabrication of photonic structures for light management in optoelectronic devices. After describing standard nanoimprint lithography and its derivative soft-lithography methods, we briefly discuss nanoimprint capabilities and prospects in photonic applications. In particular we review recent implementations of imprinted photonic structures for light management in organic light emitting diodes, solar cells, solid state lasers and sensors.

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Metal direct nanoimprinting for photonics

Cited by 55 publications

References 18 publications

Nanoimprint technology for patterning functional materials and its applications

Nanoimprint technology for patterning functional materials and its applications

Applications of nanoimprint lithography/hot embossing: a review

Nanoimprint Lithography: Toward Functional Photonic Crystals

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