Metal layer mask patterning by force microscopy lithography

Filho, Henrique Duarte da Fonseca; Maurício, M. H. P.; Ponciano, C.R.; Prioli, R.

doi:10.1016/j.mseb.2004.05.031

Cited by 31 publications

(13 citation statements)

References 9 publications

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“…al. reported similar phenomena on aluminum film by diamond tip [29]. This phenomenon indicating that the effective normal force markedly decreases when the contact area of the tip with the surface becomes larger at a force above 10 μN because of the nonlinear increments of the tip cross-section.…”

Section: Resultssupporting

confidence: 56%

Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon (DLC)-coated Si probe

Jiang

Zhou

et al. 2011

Nanoscale Res Lett

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Atomic force microscope (AFM) equipped with diamond-like carbon (DLC)-coated Si probe has been used for scratch nanolithography on Si surfaces. The effect of scratch direction, applied tip force, scratch speed, and number of scratches on the size of the scratched geometry has been investigated. The size of the groove differs with scratch direction, which increases with the applied tip force and number of scratches but decreases slightly with scratch speed. Complex nanostructures of arrays of parallel lines and square arrays are further fabricated uniformly and precisely on Si substrates at relatively high scratch speed. DLC-coated Si probe has the potential to be an alternative in AFM-based scratch nanofabrication on hard surfaces.

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Section: Resultssupporting

confidence: 56%

Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon (DLC)-coated Si probe

Jiang

Zhou

et al. 2011

Nanoscale Res Lett

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“…Their results indicated that at the same scratch conditions considered, the depths of the scratched Au grooves were larger than that of Pt grooves. Filho et al76 equipped an AFM with a diamond tip under contact mode to scratch an Al layer for patterning a Si‐based mask. The diamond tip used had an apex radius of 25 nm and the scratch depth grew from 20 to 80 nm as the applied tip force increased from 15 to 30 μN.…”

Section: Materials Removing By Mechanical Forcesmentioning

confidence: 99%

Removing Material Using Atomic Force Microscopy with Single‐ and Multiple‐Tip Sources

Tseng

2011

Small

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Atomic force microscopy (AFM) has been an effective material removing tool for fabricating various nanostructures because of its sub-nanometer precision and simplicity in operation. AFM material removing techniques have evolved from a solely mechanical process to one in which the tip can be loaded by additional energy sources, such as thermal, electric, or chemical, to enhance its fabrication abilities. In this paper, these material removing techniques are reviewed with an emphasis on their capabilities and recent progress. The recent hardware and software developments are first presented to provide a general view on the current status of the technology to be assessed. Following an overview of the feasibility and effectiveness of using mechanical scratching for removing various types of soft and hard materials, the processes of a wide range of approaches using multiple tip sources are then assessed with a focus on their principles, versatilities, and potentials for future applications.

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“…Santinacci et al 84 applied an AFM equipped with a single-crystalline diamond tip to scratch in the 100 nm range through a 10 nm thick oxide layer covering p-Si ͑100͒ surfaces. Filho et al 85 have equipped an AFM with a diamond tip operated in air under a contact mode to scratch an Al layer for patterning a Si-based mask. The diamond tip used has an apex radius of 25 nm and the scratch depth grows from 20 to 80 nm, as the applied tip force increases from 15 to 30 N.…”

Section: E Materials Removal By Scratching and Etchingmentioning

confidence: 99%

Nanofabrication by scanning probe microscope lithography: A review

Tseng

Notargiacomo

Chen

2005

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

416

238

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In addition to its well-known capabilities in imaging and spectroscopy, scanning probe microscopy ͑SPM͒ has recently shown great potentials for patterning of material structures in nanoscales. It has drawn the attention of not only the scientific community, but also the industry. This article examines various applications of SPM in modification, deposition, removal, and manipulation of materials for nanoscale fabrication. The SPM-based nanofabrication involves two basic technologies: scanning tunneling microscopy and atomic force microscopy. Major techniques related to these two technologies are evaluated with emphasis on their abilities, efficiencies, and reliabilities to make nanostructures. The principle and specific approach underlying each technique are presented; the differences and uniqueness among these techniques are subsequently discussed. Finally, concluding remarks are provided where the strength and weakness of the techniques studied are summarized and the scopes for technology improvement and future research are recommended.

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Metal layer mask patterning by force microscopy lithography

Cited by 31 publications

References 9 publications

Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon (DLC)-coated Si probe

Nanopatterning on silicon surface using atomic force microscopy with diamond-like carbon (DLC)-coated Si probe

Removing Material Using Atomic Force Microscopy with Single‐ and Multiple‐Tip Sources

Nanofabrication by scanning probe microscope lithography: A review

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