Patterning Metal‐Organic Frameworks (MOFs) is essential for their use in sensing, electronics, photonics, and encryption technologies. However, current lithography methods are limited in their ability to pattern more than two MOFs, hindering the potential for creating advanced multifunctional surfaces. Additionally, balancing design flexibility, simplicity, and cost often results in compromises. This study addresses these challenges by combining Digital‐Light Processing (DLP) with a capillary‐assisted stop‐flow system to enable multimaterial MOF patterning. It demonstrates the desktop fabrication of multiplexed arbitrary micropatterns across cm‐scale areas while preserving the MOF's pore accessibility. The ink, consisting of a MOF crystal suspension in a low volatile solvent, a mixture of high molecular weight oligomers, and a photoinitiator, is confined by capillarity in the DLP projection area and quickly exchanged using syringe pumps. The versatility of this method is demonstrated by the direct printing of a ZIF‐8‐based luminescent oxygen sensor, a 5‐component dynamic information concealment method, and a PCN‐224‐based colorimetric sensor for amines, covering disparate pore and analyte sizes. The multi‐MOF capabilities, simplicity, and accessibility of this strategy pave the way for the facile exploration of MOF materials across a wide range of applications, with the potential to significantly accelerate the design‐to‐application cycle of MOF‐based devices.