2023
DOI: 10.1016/j.mssp.2023.107344
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Metal oxide semiconductor nanowires enabled air-stable ultraviolet-driven synaptic transistors for artificial vision

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Cited by 7 publications
(4 citation statements)
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“…The photogenerated electrons move toward c-In 2 O 3 and the photogenerated holes move toward rh-In 2 O 3 . 27 When UV light is removed, prolonged LTP is achieved due to the presence of a potential barrier between c-In 2 O 3 and rh-In 2 O 3 , which prevents electron–hole recombination with subsequent slow conductance decay. Table 1 compares the LTPs of different synaptic transistors, which can clearly illustrate the memory capability of IZTO-6 nanowire synaptic transistors.…”
Section: Resultsmentioning
confidence: 99%
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“…The photogenerated electrons move toward c-In 2 O 3 and the photogenerated holes move toward rh-In 2 O 3 . 27 When UV light is removed, prolonged LTP is achieved due to the presence of a potential barrier between c-In 2 O 3 and rh-In 2 O 3 , which prevents electron–hole recombination with subsequent slow conductance decay. Table 1 compares the LTPs of different synaptic transistors, which can clearly illustrate the memory capability of IZTO-6 nanowire synaptic transistors.…”
Section: Resultsmentioning
confidence: 99%
“…Secondly, we have applied various multi-cation MOSs in UV-driven synapses, such as InZnO and zinc tin oxide (ZnSnO) nanowires, to obtain different positive characteristics of artificial synaptic transistors, such as long-memory retention, high environmental operating stability as well as the capability for versatile applications. 26,27 However, we have not implemented the asymmetric device configuration to explore the self-powering characteristics of optically driven synapses based on MOS nanowires, in an attempt to further simplify the design of artificial synapse based circuits.…”
Section: Introductionmentioning
confidence: 99%
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“…Various synaptic functions, such as PPF and LTP, could be mimicked in this structure. Many synaptic devices have been investigated substantially and shown to mimic synaptic functions based on similar mechanisms [65][66][67][68]. It should be mentioned that charge-trap-flash-based synaptic transistors were successfully fabricated based on a silicon nitride film as the charge-trapping layer and a silicon film as the channel layer in transistor devices [69,70].…”
Section: Capture and Release Of Carriersmentioning
confidence: 99%