2015
DOI: 10.7567/apex.8.025001
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Metallic core conduction in unintentionally doped ZnO nanowire

Abstract: International audienc

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Cited by 16 publications
(34 citation statements)
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“…In contrast, the range of doping level in ZnO NWs strongly depends on the growth method used, as represented in Figure 3 . From the large number of experimental data reported in the literature using field-effect transistor (FET) measurements [ 30 , 35 , 40 , 44 , 45 , 46 , 47 ], I–V measurements on four-terminal contacted ZnO NWs [ 28 , 29 , 31 , 36 , 37 , 50 ], terahertz spectroscopy [ 34 ], conductive AFM (i.e., SSRM and SCM measurements) [ 32 , 43 ], and electrochemical impedance spectroscopy [ 39 , 41 ], a range of charge carrier density values was inferred for each growth method when ZnO NWs are grown using standard conditions (i.e., typical chemical precursors, typical growth temperature and pressure). Overall, the charge carrier density of ZnO NWs typically lies in the range of 10 17 to 10 20 cm − 3 .…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
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“…In contrast, the range of doping level in ZnO NWs strongly depends on the growth method used, as represented in Figure 3 . From the large number of experimental data reported in the literature using field-effect transistor (FET) measurements [ 30 , 35 , 40 , 44 , 45 , 46 , 47 ], I–V measurements on four-terminal contacted ZnO NWs [ 28 , 29 , 31 , 36 , 37 , 50 ], terahertz spectroscopy [ 34 ], conductive AFM (i.e., SSRM and SCM measurements) [ 32 , 43 ], and electrochemical impedance spectroscopy [ 39 , 41 ], a range of charge carrier density values was inferred for each growth method when ZnO NWs are grown using standard conditions (i.e., typical chemical precursors, typical growth temperature and pressure). Overall, the charge carrier density of ZnO NWs typically lies in the range of 10 17 to 10 20 cm − 3 .…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
“…The vapour phase deposition techniques including TE, CVD, and MOCVD methods result in the formation of ZnO NWs with a lower mean charge carrier density ranging from 10 17 to 5 × 10 18 cm −3 at maximum [ 28 , 29 , 30 , 31 , 32 , 33 , 40 , 44 , 45 , 46 , 47 , 48 , 49 , 50 ]. In present deposition techniques, the incorporation of residual impurities (i.e., Al, Ga, In) acting as shallow donors is mainly responsible for this range of charge carrier density values [ 31 ]. Residual impurities usually occur as contaminants in the materials sources (i.e., TE) or in the growth chamber (i.e., CVD, MOCVD).…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
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