1995
DOI: 10.1179/cmq.1995.34.2.85
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Metallurgy of Ohmic Contacts to InP

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Cited by 4 publications
(3 citation statements)
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“…The high value of n has been ascribed to several effects: (i) interface states due to the oxide native layer located between metal and semiconductor [30,31], (ii) image force lowering of the Schottky barrier [32], and even (iii) generationrecombination currents within the space-charge region [33]. In our case, we demonstrate that the thin doping layer, n + , between the semiconductor and the metal, contributes to the formation of thermionic field emission (TFE) conduction that gives rise to a high value of ideality factor [34].…”
Section: Schottky and Pseudo-schottky Contactsmentioning
confidence: 87%
See 1 more Smart Citation
“…The high value of n has been ascribed to several effects: (i) interface states due to the oxide native layer located between metal and semiconductor [30,31], (ii) image force lowering of the Schottky barrier [32], and even (iii) generationrecombination currents within the space-charge region [33]. In our case, we demonstrate that the thin doping layer, n + , between the semiconductor and the metal, contributes to the formation of thermionic field emission (TFE) conduction that gives rise to a high value of ideality factor [34].…”
Section: Schottky and Pseudo-schottky Contactsmentioning
confidence: 87%
“…This current is intermediary between that of thermionic emission and a pure tunneling current [33,34]. The thermionic emission current permits a crossing over the barrier and dominates in semiconductors with weak doping, N D < 10 17 cm −3 .…”
Section: Variation Of N And˚b Of Pseudo-schottky Diodes With Temperaturementioning
confidence: 96%
“…1 Palladium is one of the components in many Ohmic contacts to both p-and n-type III-V semiconductors. The requirements for Ohmic contacts and Schottky barriers get more stringent as the devices decrease in size.…”
Section: Introductionmentioning
confidence: 99%