2013
DOI: 10.1063/1.4817823
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Metamorphic InAsSb-based barrier photodetectors for the long wave infrared region

Abstract: InAs0.6Sb0.4/Al0.75In0.25Sb-based barrier photodetectors were grown metamorphically on compositionally graded Ga1−xInxSb buffer layers and GaSb substrates by molecular beam epitaxy. At the wavelength of 8 μm and T = 150 K, devices with 1-μm thick absorbers demonstrated an external quantum efficiency of 18% under a bias voltage of 0.45 V.

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Cited by 32 publications
(21 citation statements)
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“…There has been rapid progress in the development of nBn devices which has resulted in the demonstration of single pixel detectors and imagers based on InAs-AlAsSb, InAsSb-AlAsSb, and InAs/ GaSb-AlAsSb absorber-barrier material pairs, grown on InAs, GaSb, and GaAs substrates and covering both the midwavelength and long-wavelength infrared (MWIR and LWIR) spectral ranges. [6][7][8][9][10][11] However, the studies of these devices were hitherto limited to cryogenic temperatures.…”
mentioning
confidence: 99%
“…There has been rapid progress in the development of nBn devices which has resulted in the demonstration of single pixel detectors and imagers based on InAs-AlAsSb, InAsSb-AlAsSb, and InAs/ GaSb-AlAsSb absorber-barrier material pairs, grown on InAs, GaSb, and GaAs substrates and covering both the midwavelength and long-wavelength infrared (MWIR and LWIR) spectral ranges. [6][7][8][9][10][11] However, the studies of these devices were hitherto limited to cryogenic temperatures.…”
mentioning
confidence: 99%
“…In addition, bulk materials have higher absorption coefficients, resulting in higher quantum efficiency. Therefore, InAsSb-based materials are also gaining attention for the development of long-wave infrared (LWIR) photodetectors [25][26][27][28][29] .…”
Section: Introductionmentioning
confidence: 99%
“…Detector devices can still be made using various barrier designs. [8][9][10][11][12]. In these types of structures a large bandgap layer is used, and surface leakage is blocked; either due to its inherent absence of surface electron accumulation and/or oxidation due to the high Al-content typically used in such designs.…”
Section: Introductionmentioning
confidence: 99%