2019
DOI: 10.1073/pnas.1908382116
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Metasurface-generated complex 3-dimensional optical fields for interference lithography

Abstract: Fast, large-scale, and robust 3-dimensional (3D) fabrication techniques for patterning a variety of structures with submicrometer resolution are important in many areas of science and technology such as photonics, electronics, and mechanics with a wide range of applications from tissue engineering to nanoarchitected materials. From several promising 3D manufacturing techniques for realizing different classes of structures suitable for various applications, interference lithography with diffractive masks stands… Show more

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Cited by 25 publications
(26 citation statements)
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“…Issues of scale-up are currently being addressed by a number of groups, for example by exploiting a femtosecond projection approach 40 and 3D light interference technology. 41 After printing, the structures were developed by submersion for 30 min in propylene glycol methylether acrylate (PGMA) followed by gently dipping into isopropanol (IPA) five times. The structures were subsequently left to dry in air.…”
Section: Particle Fabricationmentioning
confidence: 99%
“…Issues of scale-up are currently being addressed by a number of groups, for example by exploiting a femtosecond projection approach 40 and 3D light interference technology. 41 After printing, the structures were developed by submersion for 30 min in propylene glycol methylether acrylate (PGMA) followed by gently dipping into isopropanol (IPA) five times. The structures were subsequently left to dry in air.…”
Section: Particle Fabricationmentioning
confidence: 99%
“…[ 3–6 ] In the last decade, a 100 nm limit of resolution was reached with the use of radical quenchers in femtosecond laser direct writing [ 7 ] that has been reduced to 40 nm by using an activation beam [ 3 ] and tens nanometers by acting on the scan speed and self‐smoothing effect [ 8,9 ] or using photosensitive sol–gels [ 10 ] or by changing the interface height. [ 11 ] Other efforts have been made to address one‐photon hyper‐resolution using metasurfaces as diffractive elements [ 12 ] or exploiting evanescent wave propagation in plasmonic interfaces. [ 13–15 ] The hyper‐resolution fabrication process, in fact, is of paramount importance for realizing perfectly flat optics and lenses that directly flow into different applications such as: imaging systems, discrete lenses, achromatic optical, and augmented‐reality (AR) devices, just to name a few.…”
Section: Introductionmentioning
confidence: 99%
“…In recent years, a great interest has been spurred by the tremendous technological potential of optically thin nanopatterned surfaces, better known as metasurfaces [1][2][3][4][5][6][7][8][9][10][11][12]. Metasurfaces allow wavefront engineering, local phase and amplitude control of light along the surface by using dielectric or plasmonic resonators [13][14][15][16][17][18][19][20][21][22]. Plasmonic materials are next-generation nanomaterials with enormous potential to transform health care by providing advanced sensors [23][24][25][26], imaging devices [27,28], and therapies [29][30][31][32], as well as to advance energy-relevant materials, such as bio-antennae and light-harvesting systems [33][34][35].…”
Section: Introductionmentioning
confidence: 99%