Topological materials have great potential in lossless electronic transportation. Bi 2 Te 3 as three-dimensional (3D) topological insulator is predicted to exhibit many amazing electromagnetic characteristics, which are widely studied all over the world. However, current research available on Bi 2 Te 3 materials is not adequate, and a comprehensive understanding of its properties is necessary. In this work, near-field plasmon imaging based on Bi 2 Te 3 nanostructures and the kinetic energy spectra of emitted electrons from Bi 2 Te 3 film by using photoemission electron microscope instruments is studied. Under UV laser excitation of 273 nm, the electrons can be excited from the trap states in bandgap, which provides a feasible idea for observing the trap energy levels of Bi 2 Te 3 materials. Moreover, the imaging applications of nanostructures in Bi 2 Te 3 film based on their polarization-dependence and wavelength-dependence properties are also demonstrated, providing a more degrees of freedom for imaging, and can realize multidimensional and multi-multiplexing imaging technology of topological materials. This work provides a novel method to enrich the Bi 2 Te 3 film properties from the view of near-field plasmon imaging and kinetic energy distribution, paving the way for realizing practical applications of topological materials.